Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/115989
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Title: Donnan-engineered inner Helmholtz plane enabling ultra-stable aqueous bismuth electrode
Authors: Qin, T
Zhang, W
Wang, D
Zhang, Y
Dong, T
Zhang, Z
Leong, SKW
Chen, W
Samy, S
Liu, H
Wang, Y
Zhao, X
Dong, W
Ni, M 
Leung, DYC
Guo, Z
Pan, W
Issue Date: 20-Oct-2025
Source: Advanced science, 20 Oct. 2025, v. 12, no. 39, e08965
Abstract: The electrochemical instability of the solid-liquid interface remains a critical bottleneck in rechargeable aqueous metal batteries (RAMBs), where traditional strategies fail to resolve the inherent conflict between electrochemical and parasitic reactions at the inner Helmholtz plane (IHP). Herein, inspiring from the ion-sieving principles of the Donnan effect, classical electrostatics is integrated with interfacial engineering by creating a phosphate anion (PO43−)-adsorbed IHP on a bismuth (Bi) electrode. The immobilized PO43− establishes a sustained Donnan potential, driving three key functions: i) ion and reaction sieving through charge-selective ion partitioning, enriching Na⁺ while excluding OH⁻ to enable selective (de)alloying over corrosion reaction; ii) electron confinement through Donnan potential to suppress parasitic electron leakage; and iii) dynamic stabilization of the IHP through strong anion chemisorption, bridging the classical Donnan model with electrochemistry. As a result, the Bi electrode demonstrates a superior cycling stability (200 mAh g−1 retention after 3000 cycles at 2 A g−1) and ultrahigh-rate performance (134 mAh g−1 at 16 A g−1). By extending the Donnan effect in electrochemistry, the research creates a universal interfacial paradigm based on charge-selective ion partitioning and electron confinement. This breakthrough provides a transformative strategy to decouple desired electrochemical reactions from parasitic side reactions, paving the way for advanced RAMBs.
Keywords: Aqueous metal electrode
Bismuth
Donnan effect
Inner helmholtz plane
Ion-sieving and reaction-sieving
Publisher: Wiley-VCH Verlag GmbH & Co. KGaA
Journal: Advanced science 
EISSN: 2198-3844
DOI: 10.1002/advs.202508965
Rights: © 2025 The Author(s). Advanced Science published by Wiley-VCHGmbH. This is an open access article under the terms of the CreativeCommons Attribution License (http://creativecommons.org/licenses/by/4.0/), which permits use, distribution andreproduction in any medium, provided the original work is properly cited.
The following publication T. Qin, W. Zhang, D. Wang, et al. “ Donnan-Engineered Inner Helmholtz Plane Enabling Ultra-Stable Aqueous Bismuth Electrode.” Adv. Sci. 12, no. 39 (2025): e08965 is available at https://doi.org/10.1002/advs.202508965.
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