Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/115989
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dc.contributorDepartment of Building and Real Estate-
dc.creatorQin, Ten_US
dc.creatorZhang, Wen_US
dc.creatorWang, Den_US
dc.creatorZhang, Yen_US
dc.creatorDong, Ten_US
dc.creatorZhang, Zen_US
dc.creatorLeong, SKWen_US
dc.creatorChen, Wen_US
dc.creatorSamy, Sen_US
dc.creatorLiu, Hen_US
dc.creatorWang, Yen_US
dc.creatorZhao, Xen_US
dc.creatorDong, Wen_US
dc.creatorNi, Men_US
dc.creatorLeung, DYCen_US
dc.creatorGuo, Zen_US
dc.creatorPan, Wen_US
dc.date.accessioned2025-11-18T06:48:46Z-
dc.date.available2025-11-18T06:48:46Z-
dc.identifier.urihttp://hdl.handle.net/10397/115989-
dc.language.isoenen_US
dc.publisherWiley-VCH Verlag GmbH & Co. KGaAen_US
dc.rights© 2025 The Author(s). Advanced Science published by Wiley-VCHGmbH. This is an open access article under the terms of the CreativeCommons Attribution License (http://creativecommons.org/licenses/by/4.0/), which permits use, distribution andreproduction in any medium, provided the original work is properly cited.en_US
dc.rightsThe following publication T. Qin, W. Zhang, D. Wang, et al. “ Donnan-Engineered Inner Helmholtz Plane Enabling Ultra-Stable Aqueous Bismuth Electrode.” Adv. Sci. 12, no. 39 (2025): e08965 is available at https://doi.org/10.1002/advs.202508965.en_US
dc.subjectAqueous metal electrodeen_US
dc.subjectBismuthen_US
dc.subjectDonnan effecten_US
dc.subjectInner helmholtz planeen_US
dc.subjectIon-sieving and reaction-sievingen_US
dc.titleDonnan-engineered inner Helmholtz plane enabling ultra-stable aqueous bismuth electrodeen_US
dc.typeJournal/Magazine Articleen_US
dc.identifier.volume12en_US
dc.identifier.issue39en_US
dc.identifier.doi10.1002/advs.202508965en_US
dcterms.abstractThe electrochemical instability of the solid-liquid interface remains a critical bottleneck in rechargeable aqueous metal batteries (RAMBs), where traditional strategies fail to resolve the inherent conflict between electrochemical and parasitic reactions at the inner Helmholtz plane (IHP). Herein, inspiring from the ion-sieving principles of the Donnan effect, classical electrostatics is integrated with interfacial engineering by creating a phosphate anion (PO43−)-adsorbed IHP on a bismuth (Bi) electrode. The immobilized PO43− establishes a sustained Donnan potential, driving three key functions: i) ion and reaction sieving through charge-selective ion partitioning, enriching Na⁺ while excluding OH⁻ to enable selective (de)alloying over corrosion reaction; ii) electron confinement through Donnan potential to suppress parasitic electron leakage; and iii) dynamic stabilization of the IHP through strong anion chemisorption, bridging the classical Donnan model with electrochemistry. As a result, the Bi electrode demonstrates a superior cycling stability (200 mAh g−1 retention after 3000 cycles at 2 A g−1) and ultrahigh-rate performance (134 mAh g−1 at 16 A g−1). By extending the Donnan effect in electrochemistry, the research creates a universal interfacial paradigm based on charge-selective ion partitioning and electron confinement. This breakthrough provides a transformative strategy to decouple desired electrochemical reactions from parasitic side reactions, paving the way for advanced RAMBs.-
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationAdvanced science, 20 Oct. 2025, v. 12, no. 39, e08965en_US
dcterms.isPartOfAdvanced scienceen_US
dcterms.issued2025-10-20-
dc.identifier.scopus2-s2.0-105012023751-
dc.identifier.pmid40729533-
dc.identifier.eissn2198-3844en_US
dc.identifier.artne08965en_US
dc.description.validate202511 bcch-
dc.description.oaVersion of Recorden_US
dc.identifier.FolderNumberOA_Scopus/WOS-
dc.description.fundingSourceRGCen_US
dc.description.fundingSourceOthersen_US
dc.description.fundingTextThe authors acknowledge the financial support from the CRF grant of the Hong Kong Research Grant Council (C5031-20G), Guangdong Basic and Applied Basic Research Fund (2024A1515013283), the National Natural Science Foundation of China (Project No. 12302124), and the Shenzhen Science and Technology Program (KJZD20230923115402005) for financial support.en_US
dc.description.pubStatusPublisheden_US
dc.description.oaCategoryCCen_US
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