Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/113347
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Title: Response to “Comment on Influence of indium tin oxide thin-film quality on reverse leakage current of indium tin oxide/ n-GaN Schottky contacts
Authors: Wang, RX 
Xu, SJ
Beling, CD
Cheung, CK
Issue Date: 22-Jan-2007
Source: Applied physics letters, 22 Jan. 2007, v. 90, no. 4, 046102
Publisher: AIP Publishing LLC
Journal: Applied physics letters 
ISSN: 0003-6951
EISSN: 1077-3118
DOI: 10.1063/1.2435356
Rights: © 2007 American Institute of Physics
This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in R. X. Wang, S. J. Xu, C. D. Beling, C. K. Cheung; Response to “Comment on Influence of indium tin oxide thin-film quality on reverse leakage current of indium tin oxide/ n-GaN Schottky contacts [Appl. Phys. Lett. 90, 046101 (2007)]”. Appl. Phys. Lett. 22 January 2007; 90 (4): 046102 and may be found at https://doi.org/10.1063/1.2435356.
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