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http://hdl.handle.net/10397/109487
Title: | DynaMask : dynamic mask selection for instance segmentation | Authors: | Li, R He, C Li, S Zhang, Y Zhang, L |
Issue Date: | 2023 | Source: | 2023 IEEE/CVF Conference on Computer Vision and Pattern Recognition : Vancouver, Canada, 18 - 22 June 2023, p. 11279-11288 | Abstract: | The representative instance segmentation methods mostly segment different object instances with a mask of the fixed resolution, e.g., 28 × 28 grid. However, a low-resolution mask loses rich details, while a high-resolution mask incurs quadratic computation overhead. It is a challenging task to predict the optimal binary mask for each instance. In this paper, we propose to dynamically select suitable masks for different object proposals. First, a dual-level Feature Pyramid Network (FPN) with adaptive feature aggregation is developed to gradually increase the mask grid resolution, ensuring high-quality segmentation of objects. Specifically, an efficient region-level top-down path (r-FPN) is introduced to incorporate complementary contextual and detailed information from different stages of image-level FPN (i-FPN). Then, to alleviate the increase of computation and memory costs caused by using large masks, we develop a Mask Switch Module (MSM) with negligible computational cost to select the most suitable mask resolution for each instance, achieving high efficiency while maintaining high segmentation accuracy. Without bells and whistles, the proposed method, namely DynaMask, brings consistent and noticeable performance improvements over other state-of-the-arts at a moderate computation overhead. The source code: https://github.com/lslrh/DynaMask. | Publisher: | Institute of Electrical and Electronics Engineers | ISBN: | 979-8-3503-0129-8 | DOI: | 10.1109/CVPR52729.2023.01085 | Rights: | © 2023 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works. The following publication R. Li, C. He, S. Li, Y. Zhang and L. Zhang, "DynaMask: Dynamic Mask Selection for Instance Segmentation," 2023 IEEE/CVF Conference on Computer Vision and Pattern Recognition (CVPR), Vancouver, BC, Canada, 2023, pp. 11279-11288 is available at https://doi.org/10.1109/CVPR52729.2023.01085. |
Appears in Collections: | Conference Paper |
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Li_DynaMask_Dynamic_Mask.pdf | Pre-Published version | 4.17 MB | Adobe PDF | View/Open |
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