Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/109487
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dc.contributorDepartment of Computing-
dc.creatorLi, Ren_US
dc.creatorHe, Cen_US
dc.creatorLi, Sen_US
dc.creatorZhang, Yen_US
dc.creatorZhang, Len_US
dc.date.accessioned2024-11-01T08:04:34Z-
dc.date.available2024-11-01T08:04:34Z-
dc.identifier.isbn979-8-3503-0129-8en_US
dc.identifier.urihttp://hdl.handle.net/10397/109487-
dc.language.isoenen_US
dc.publisherInstitute of Electrical and Electronics Engineersen_US
dc.rights© 2023 IEEE. Personal use of this material is permitted. Permission from IEEE must be obtained for all other uses, in any current or future media, including reprinting/republishing this material for advertising or promotional purposes, creating new collective works, for resale or redistribution to servers or lists, or reuse of any copyrighted component of this work in other works.en_US
dc.rightsThe following publication R. Li, C. He, S. Li, Y. Zhang and L. Zhang, "DynaMask: Dynamic Mask Selection for Instance Segmentation," 2023 IEEE/CVF Conference on Computer Vision and Pattern Recognition (CVPR), Vancouver, BC, Canada, 2023, pp. 11279-11288 is available at https://doi.org/10.1109/CVPR52729.2023.01085.en_US
dc.titleDynaMask : dynamic mask selection for instance segmentationen_US
dc.typeConference Paperen_US
dc.identifier.spage11279en_US
dc.identifier.epage11288en_US
dc.identifier.doi10.1109/CVPR52729.2023.01085en_US
dcterms.abstractThe representative instance segmentation methods mostly segment different object instances with a mask of the fixed resolution, e.g., 28 × 28 grid. However, a low-resolution mask loses rich details, while a high-resolution mask incurs quadratic computation overhead. It is a challenging task to predict the optimal binary mask for each instance. In this paper, we propose to dynamically select suitable masks for different object proposals. First, a dual-level Feature Pyramid Network (FPN) with adaptive feature aggregation is developed to gradually increase the mask grid resolution, ensuring high-quality segmentation of objects. Specifically, an efficient region-level top-down path (r-FPN) is introduced to incorporate complementary contextual and detailed information from different stages of image-level FPN (i-FPN). Then, to alleviate the increase of computation and memory costs caused by using large masks, we develop a Mask Switch Module (MSM) with negligible computational cost to select the most suitable mask resolution for each instance, achieving high efficiency while maintaining high segmentation accuracy. Without bells and whistles, the proposed method, namely DynaMask, brings consistent and noticeable performance improvements over other state-of-the-arts at a moderate computation overhead. The source code: https://github.com/lslrh/DynaMask.-
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitation2023 IEEE/CVF Conference on Computer Vision and Pattern Recognition : Vancouver, Canada, 18 - 22 June 2023, p. 11279-11288en_US
dcterms.issued2023-
dc.identifier.scopus2-s2.0-85170433836-
dc.relation.ispartofbook2023 IEEE/CVF Conference on Computer Vision and Pattern Recognition : Vancouver, Canada, 18 - 22 June 2023en_US
dc.relation.conferenceConference on Computer Vision and Pattern Recognition [CVPR]-
dc.description.validate202411 bcch-
dc.description.oaAccepted Manuscripten_US
dc.identifier.FolderNumberOA_Others-
dc.description.fundingSourceRGCen_US
dc.description.pubStatusPublisheden_US
dc.description.oaCategoryGreen (AAM)en_US
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