Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/100349
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Title: Effect of post-annealing on laser-ablation deposited WS2 thin films
Authors: Wang, H 
Ng, SM 
Wong, HF 
Wong, WC 
Lam, KK 
Liu, YK 
Fei, LF 
Zhou, YB
Mak, CL 
Wang, Y
Leung, CW 
Issue Date: Jun-2018
Source: Vacuum, June 2018, v. 152, p. 239-242
Abstract: We deposited WS2 thin films by pulsed laser deposition on sapphire substrates at room temperature, and studied the effect of post-annealing temperature on the quality of the WS2 films. By comparing the full-width-at-half-maximum of the characteristic WS2 Raman peaks, we explored the relationship between the post-annealing temperature and the crystallinity of WS2 films. Optoelectronic measurements conducted on post-annealed WS2 film-based photodetectors showed improvement with rising annealing temperatures. Our study revealed the possibility of preparing large-area dichalcogenides for optoelectronic applications.
Keywords: Post-annealing
Pulsed laser deposition
Raman spectroscopy
WS2
Publisher: Pergamon Press
Journal: Vacuum 
EISSN: 0042-207X
DOI: 10.1016/j.vacuum.2018.03.024
Rights: © 2018 Elsevier Ltd. All rights reserved.
© 2018. This manuscript version is made available under the CC-BY-NC-ND 4.0 license https://creativecommons.org/licenses/by-nc-nd/4.0/
The following publication Wang, H., Ng, S. M., Wong, H. F., Wong, W. C., Lam, K. K., Liu, Y. K., ... & Leung, C. W. (2018). Effect of post-annealing on laser-ablation deposited WS2 thin films. Vacuum, 152, 239-242 is available at https://doi.org/10.1016/j.vacuum.2018.03.024.
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