Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/100349
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dc.contributorDepartment of Applied Physics-
dc.creatorWang, Hen_US
dc.creatorNg, SMen_US
dc.creatorWong, HFen_US
dc.creatorWong, WCen_US
dc.creatorLam, KKen_US
dc.creatorLiu, YKen_US
dc.creatorFei, LFen_US
dc.creatorZhou, YBen_US
dc.creatorMak, CLen_US
dc.creatorWang, Yen_US
dc.creatorLeung, CWen_US
dc.date.accessioned2023-08-08T01:55:16Z-
dc.date.available2023-08-08T01:55:16Z-
dc.identifier.urihttp://hdl.handle.net/10397/100349-
dc.language.isoenen_US
dc.publisherPergamon Pressen_US
dc.rights© 2018 Elsevier Ltd. All rights reserved.en_US
dc.rights© 2018. This manuscript version is made available under the CC-BY-NC-ND 4.0 license https://creativecommons.org/licenses/by-nc-nd/4.0/en_US
dc.rightsThe following publication Wang, H., Ng, S. M., Wong, H. F., Wong, W. C., Lam, K. K., Liu, Y. K., ... & Leung, C. W. (2018). Effect of post-annealing on laser-ablation deposited WS2 thin films. Vacuum, 152, 239-242 is available at https://doi.org/10.1016/j.vacuum.2018.03.024.en_US
dc.subjectPost-annealingen_US
dc.subjectPulsed laser depositionen_US
dc.subjectRaman spectroscopyen_US
dc.subjectWS2en_US
dc.titleEffect of post-annealing on laser-ablation deposited WS2 thin filmsen_US
dc.typeJournal/Magazine Articleen_US
dc.identifier.spage239en_US
dc.identifier.epage242en_US
dc.identifier.volume152en_US
dc.identifier.doi10.1016/j.vacuum.2018.03.024en_US
dcterms.abstractWe deposited WS2 thin films by pulsed laser deposition on sapphire substrates at room temperature, and studied the effect of post-annealing temperature on the quality of the WS2 films. By comparing the full-width-at-half-maximum of the characteristic WS2 Raman peaks, we explored the relationship between the post-annealing temperature and the crystallinity of WS2 films. Optoelectronic measurements conducted on post-annealed WS2 film-based photodetectors showed improvement with rising annealing temperatures. Our study revealed the possibility of preparing large-area dichalcogenides for optoelectronic applications.-
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationVacuum, June 2018, v. 152, p. 239-242en_US
dcterms.isPartOfVacuumen_US
dcterms.issued2018-06-
dc.identifier.scopus2-s2.0-85044471727-
dc.identifier.eissn0042-207Xen_US
dc.description.validate202308 bcvc-
dc.description.oaAccepted Manuscripten_US
dc.identifier.FolderNumberAP-0501-
dc.description.fundingSourceOthersen_US
dc.description.fundingTextThe Hong Kong Polytechnic Universityen_US
dc.description.pubStatusPublisheden_US
dc.identifier.OPUS24330099-
dc.description.oaCategoryGreen (AAM)en_US
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