Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/4889
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Title: Atomic force microscopy-induced electric field in ferroelectric thin films
Authors: Wang, B
Woo, CH
Issue Date: 15-Sep-2003
Source: Journal of applied physics, 15 Sept. 2003, v. 94, no. 6, p. 4053-4059
Abstract: The use of atomic force microscopy (AFM) to tailor and image ferroelectric domains in the submicron and nanometer ranges is gaining increasing attention. Many applications have been developed that make use of the superhigh electric field generated by the sharp AFM tip in a local area. In this article, we derive an explicit expression for the AFM-induced electric field in a ferroelectric thin film. Based on a similar approach, we also obtain the depolarization field created by polarization charges using the Green function technique. Based on the expressions derived, the effects of the substrate are discussed.
Keywords: Ferroelectric thin films
Atomic force microscopy
Electric domains
Green's function methods
Electric fields
Dielectric depolarisation
Publisher: American Institute of Physics
Journal: Journal of applied physics 
ISSN: 0021-8979
EISSN: 1089-7550
DOI: 10.1063/1.1603345
Rights: © 2003 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in B. Wang & C. H. Woo, J. Appl. Phys. 94, 4053 (2003) and may be found at http://link.aip.org/link/?jap/94/4053.
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