Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/9618
Title: Achievement of controlled resistive response of nanogapped palladium film to hydrogen
Authors: Zhao, M
Wong, MH
Ong, CW 
Issue Date: 2015
Source: Applied physics letters, 2015, v. 107, no. 3, 33108, p. 033108-1-033108-5
Abstract: Palladium (Pd) film containing nanogaps of well controlled dimension was fabricated on a Si wafer having a high-aspect-ratio micropillar. The Pd film was arranged to experience hydrogen (H2)-induced volume expansion. (i) If the nanogap is kept open, its width is narrowed down. A discharge current was generated to give a strong, fast, and repeatable on-off type resistive switching response. (ii) If the nanogap is closed, the cross section of the conduction path varies to give continuous H<inf>2</inf>-concentration dependent resistive response. The influence of stresses and related physical mechanisms are discussed.
Publisher: American Institute of Physics
Journal: Applied physics letters 
ISSN: 0003-6951
EISSN: 1077-3118
DOI: 10.1063/1.4927394
Rights: © 2015 AIP Publishing LLC.
This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in M. Zhao, M. H. Wong and C. W. Ong, Appl. Phys. Lett. 107, 033108 (2015) and may be found at https://dx.doi.org/10.1063/1.4927394
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