Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/9618
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dc.contributorDepartment of Applied Physics-
dc.creatorZhao, M-
dc.creatorWong, MH-
dc.creatorOng, CW-
dc.date.accessioned2015-10-13T08:26:11Z-
dc.date.available2015-10-13T08:26:11Z-
dc.identifier.issn0003-6951-
dc.identifier.urihttp://hdl.handle.net/10397/9618-
dc.language.isoenen_US
dc.publisherAmerican Institute of Physicsen_US
dc.rights© 2015 AIP Publishing LLC.en_US
dc.rightsThis article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in M. Zhao, M. H. Wong and C. W. Ong, Appl. Phys. Lett. 107, 033108 (2015) and may be found at https://dx.doi.org/10.1063/1.4927394en_US
dc.titleAchievement of controlled resistive response of nanogapped palladium film to hydrogenen_US
dc.typeJournal/Magazine Articleen_US
dc.identifier.volume107-
dc.identifier.issue3-
dc.identifier.doi10.1063/1.4927394-
dcterms.abstractPalladium (Pd) film containing nanogaps of well controlled dimension was fabricated on a Si wafer having a high-aspect-ratio micropillar. The Pd film was arranged to experience hydrogen (H2)-induced volume expansion. (i) If the nanogap is kept open, its width is narrowed down. A discharge current was generated to give a strong, fast, and repeatable on-off type resistive switching response. (ii) If the nanogap is closed, the cross section of the conduction path varies to give continuous H<inf>2</inf>-concentration dependent resistive response. The influence of stresses and related physical mechanisms are discussed.-
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationApplied physics letters, 2015, v. 107, no. 3, 33108, p. 033108-1-033108-5-
dcterms.isPartOfApplied physics letters-
dcterms.issued2015-
dc.identifier.scopus2-s2.0-84937841888-
dc.identifier.eissn1077-3118-
dc.identifier.rosgroupid2015002365-
dc.description.ros2015-2016 > Academic research: refereed > Publication in refereed journal-
dc.description.oaVersion of Recorden_US
dc.identifier.FolderNumberOA_IR/PIRAen_US
dc.description.pubStatusPublisheden_US
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