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http://hdl.handle.net/10397/92417
Title: | A novel magnetic field-assisted mass polishing of freeform surfaces | Authors: | Wang, C Cheung, CF Ho, LT Yung, KL Kong, L |
Issue Date: | May-2020 | Source: | Journal of materials processing technology, May 2020, v. 279, 116552 | Abstract: | This paper presents a novel magnetic field-assisted mass polishing (MAMP) technology for high-efficiency finishing of a number of freeform components simultaneously. The MAMP makes use of a rotational magnetic field applied outside an annular chamber which drives the magnetic abrasives to impinge on and remove material from the workpiece mounted inside the chamber. The influence of the magnetic field on the material removal characteristics is analysed by the finite element method. The factors affecting surface generation were studied through polishing experiments. Experimental results show that MAMP is effective for polishing of a number of freeform surfaces with nanometric surface finish. | Keywords: | Finishing Freeform surfaces Magnetic abrasive Magnetic field assisted Mass polishing Ultra-precision machining |
Publisher: | Elsevier | Journal: | Journal of materials processing technology | ISSN: | 0924-0136 | EISSN: | 1873-4774 | DOI: | 10.1016/j.jmatprotec.2019.116552 | Rights: | © 2019 Elsevier B.V. All rights reserved. © 2019. This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/. The following publication Wang, C., Cheung, C. F., Ho, L. T., Yung, K. L., & Kong, L. (2020). A novel magnetic field-assisted mass polishing of freeform surfaces. Journal of Materials Processing Technology, 279, 116552 is available at https://dx.doi.org/10.1016/j.jmatprotec.2019.116552. |
Appears in Collections: | Journal/Magazine Article |
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Wang_Novel_Magnetic_Field-assisted.pdf | Pre-Published version | 4.54 MB | Adobe PDF | View/Open |
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