Please use this identifier to cite or link to this item:
http://hdl.handle.net/10397/92417
DC Field | Value | Language |
---|---|---|
dc.contributor | Department of Industrial and Systems Engineering | en_US |
dc.creator | Wang, C | en_US |
dc.creator | Cheung, CF | en_US |
dc.creator | Ho, LT | en_US |
dc.creator | Yung, KL | en_US |
dc.creator | Kong, L | en_US |
dc.date.accessioned | 2022-04-01T01:55:50Z | - |
dc.date.available | 2022-04-01T01:55:50Z | - |
dc.identifier.issn | 0924-0136 | en_US |
dc.identifier.uri | http://hdl.handle.net/10397/92417 | - |
dc.language.iso | en | en_US |
dc.publisher | Elsevier | en_US |
dc.rights | © 2019 Elsevier B.V. All rights reserved. | en_US |
dc.rights | © 2019. This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/. | en_US |
dc.rights | The following publication Wang, C., Cheung, C. F., Ho, L. T., Yung, K. L., & Kong, L. (2020). A novel magnetic field-assisted mass polishing of freeform surfaces. Journal of Materials Processing Technology, 279, 116552 is available at https://dx.doi.org/10.1016/j.jmatprotec.2019.116552. | en_US |
dc.subject | Finishing | en_US |
dc.subject | Freeform surfaces | en_US |
dc.subject | Magnetic abrasive | en_US |
dc.subject | Magnetic field assisted | en_US |
dc.subject | Mass polishing | en_US |
dc.subject | Ultra-precision machining | en_US |
dc.title | A novel magnetic field-assisted mass polishing of freeform surfaces | en_US |
dc.type | Journal/Magazine Article | en_US |
dc.identifier.volume | 279 | en_US |
dc.identifier.doi | 10.1016/j.jmatprotec.2019.116552 | en_US |
dcterms.abstract | This paper presents a novel magnetic field-assisted mass polishing (MAMP) technology for high-efficiency finishing of a number of freeform components simultaneously. The MAMP makes use of a rotational magnetic field applied outside an annular chamber which drives the magnetic abrasives to impinge on and remove material from the workpiece mounted inside the chamber. The influence of the magnetic field on the material removal characteristics is analysed by the finite element method. The factors affecting surface generation were studied through polishing experiments. Experimental results show that MAMP is effective for polishing of a number of freeform surfaces with nanometric surface finish. | en_US |
dcterms.accessRights | open access | en_US |
dcterms.bibliographicCitation | Journal of materials processing technology, May 2020, v. 279, 116552 | en_US |
dcterms.isPartOf | Journal of materials processing technology | en_US |
dcterms.issued | 2020-05 | - |
dc.identifier.scopus | 2-s2.0-85076253283 | - |
dc.identifier.eissn | 1873-4774 | en_US |
dc.identifier.artn | 116552 | en_US |
dc.description.validate | 202203 bcch | en_US |
dc.description.oa | Accepted Manuscript | en_US |
dc.identifier.FolderNumber | a1238 | - |
dc.identifier.SubFormID | 44309 | - |
dc.description.fundingSource | Others | en_US |
dc.description.fundingText | The Hong Kong Polytechnic University | en_US |
dc.description.pubStatus | Published | en_US |
dc.description.oaCategory | Green (AAM) | en_US |
Appears in Collections: | Journal/Magazine Article |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
Wang_Novel_Magnetic_Field-assisted.pdf | Pre-Published version | 4.54 MB | Adobe PDF | View/Open |
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