Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/92417
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dc.contributorDepartment of Industrial and Systems Engineeringen_US
dc.creatorWang, Cen_US
dc.creatorCheung, CFen_US
dc.creatorHo, LTen_US
dc.creatorYung, KLen_US
dc.creatorKong, Len_US
dc.date.accessioned2022-04-01T01:55:50Z-
dc.date.available2022-04-01T01:55:50Z-
dc.identifier.issn0924-0136en_US
dc.identifier.urihttp://hdl.handle.net/10397/92417-
dc.language.isoenen_US
dc.publisherElsevieren_US
dc.rights© 2019 Elsevier B.V. All rights reserved.en_US
dc.rights© 2019. This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/.en_US
dc.rightsThe following publication Wang, C., Cheung, C. F., Ho, L. T., Yung, K. L., & Kong, L. (2020). A novel magnetic field-assisted mass polishing of freeform surfaces. Journal of Materials Processing Technology, 279, 116552 is available at https://dx.doi.org/10.1016/j.jmatprotec.2019.116552.en_US
dc.subjectFinishingen_US
dc.subjectFreeform surfacesen_US
dc.subjectMagnetic abrasiveen_US
dc.subjectMagnetic field assisteden_US
dc.subjectMass polishingen_US
dc.subjectUltra-precision machiningen_US
dc.titleA novel magnetic field-assisted mass polishing of freeform surfacesen_US
dc.typeJournal/Magazine Articleen_US
dc.identifier.volume279en_US
dc.identifier.doi10.1016/j.jmatprotec.2019.116552en_US
dcterms.abstractThis paper presents a novel magnetic field-assisted mass polishing (MAMP) technology for high-efficiency finishing of a number of freeform components simultaneously. The MAMP makes use of a rotational magnetic field applied outside an annular chamber which drives the magnetic abrasives to impinge on and remove material from the workpiece mounted inside the chamber. The influence of the magnetic field on the material removal characteristics is analysed by the finite element method. The factors affecting surface generation were studied through polishing experiments. Experimental results show that MAMP is effective for polishing of a number of freeform surfaces with nanometric surface finish.en_US
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationJournal of materials processing technology, May 2020, v. 279, 116552en_US
dcterms.isPartOfJournal of materials processing technologyen_US
dcterms.issued2020-05-
dc.identifier.scopus2-s2.0-85076253283-
dc.identifier.eissn1873-4774en_US
dc.identifier.artn116552en_US
dc.description.validate202203 bcchen_US
dc.description.oaAccepted Manuscripten_US
dc.identifier.FolderNumbera1238-
dc.identifier.SubFormID44309-
dc.description.fundingSourceOthersen_US
dc.description.fundingTextThe Hong Kong Polytechnic Universityen_US
dc.description.pubStatusPublisheden_US
dc.description.oaCategoryGreen (AAM)en_US
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