Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/63764
Title: Design of double-beam interferometer for detecting piezoelectric strain of thin film
Other Titles: 檢測薄膜壓電形變的雙光束探測干涉儀的設計
Authors: Huang, A
Shi, BX
Chan, HLW 
Keywords: Double beam interferometers
Piezoelectric effects
Bending effects
Thin film measurement
Issue Date: 2002
Publisher: 中國學術期刊 (光盤版) 電子雜誌社
Source: 光電工程 (Opto-electronic engineering), 2002, v. 29, no. 5, p. 45-48 How to cite?
Journal: 光電工程 (Opto-electronic engineering) 
Abstract: In order to measure micro-strain of piezoelectric thin film under action of electric field and avoiding the impact of substrate bending effect, a double-beam interferometer is designed. The objective of high stability and high resolution is achieved through feedback control and phase-locking detection technique. The minimum detectable strain is as small as 0.001nm. With measurement and data processing are controlled by a computer, the system has the advantages of convenience, fast measurement speed and high accuracy.
URI: http://hdl.handle.net/10397/63764
ISSN: 1003-501X
Rights: © 2002 中国学术期刊电子杂志出版社。本内容的使用仅限于教育、科研之目的。
© 2002 China Academic Journal Electronic Publishing House. It is to be used strictly for educational and research purposes.
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