Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/31213
Title: Use of the ultraviolet absorption spectrum of CF 2 to determine the spatially resolved absolute CF 2 density, rotational temperature, and vibrational distribution in a plasma etching reactor
Authors: Bulcourt, N
Booth, JP
Hudson, EA
Luque, J
Mok, DKW 
Lee, EP
Chau, FT
Dyke, JM
Issue Date: 2004
Publisher: American Institute of Physics
Source: Journal of chemical physics, 2004, v. 120, no. 20, p. 9499-9508 How to cite?
Journal: Journal of chemical physics 
Abstract: The CF 2 densities in a plasma etch reactor used for industrial wafer processing were determined using broadband ultraviolet absorption spectroscopy. The absorption cross sections of CF 2 at selected wavelengths, used for calculating the number densities from the experimental spectra were determined using Franck Condon factors. The number densities of CF 2 were also determined in different regions of the plasma, including the center of the plasma and outside the plasma volume. The CF 2 rotational temperatures and vibrational energy distributions were also estimated.
URI: http://hdl.handle.net/10397/31213
ISSN: 0021-9606
EISSN: 1089-7690
DOI: 10.1063/1.1695313
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