Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/95689
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dc.contributorDepartment of Applied Physicsen_US
dc.creatorYau, HMen_US
dc.creatorChen, Xen_US
dc.creatorWong, CMen_US
dc.creatorChen, Den_US
dc.creatorDai, Jen_US
dc.date.accessioned2022-10-05T03:55:25Z-
dc.date.available2022-10-05T03:55:25Z-
dc.identifier.issn1044-5803en_US
dc.identifier.urihttp://hdl.handle.net/10397/95689-
dc.language.isoenen_US
dc.publisherElsevieren_US
dc.rights© 2021 Elsevier Inc. All rights reserved.en_US
dc.rights© 2021. This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/.en_US
dc.rightsThe following publication Yau, H. M., Chen, X., Wong, C. M., Chen, D., & Dai, J. (2021). Orientation control of phase transition and ferroelectricity in Al-doped HfO2 thin films. Materials Characterization, 176, 111114 is available at https://doi.org/10.1016/j.matchar.2021.111114.en_US
dc.subjectFerroelectricen_US
dc.subjectHafnium oxideen_US
dc.subjectPhase transitionen_US
dc.subjectThin filmen_US
dc.titleOrientation control of phase transition and ferroelectricity in Al-doped HfO₂ thin filmsen_US
dc.typeJournal/Magazine Articleen_US
dc.identifier.volume176en_US
dc.identifier.doi10.1016/j.matchar.2021.111114en_US
dcterms.abstractBinary ferroelectric materials such as hafnium oxide have been intensively studied, which are expected to exhibit robust ferroelectricity comparable to the perovskite-based ferroelectrics at nanoscale. Here, using the combination of X-ray diffraction (XRD) associate with Transmission Electron Microscope (TEM), we reveal the epitaxial growth of Al-doped HfO₂ possessing various phase structures on different oriented SrTiO₃ substrates. The well-oriented films show different ferroelectricity indicated by piezoresponse force microscopy (PFM). The film grown on the (111) SrTiO₃ substrate shows the largest electromechanical effect. These results, with the analyses of structural characterizations, demonstrate the orientation control of phase transitions and ferroelectricity in Al-doped HfO₂ thin films.en_US
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationMaterials characterization, June 2021, v. 176, 111114en_US
dcterms.isPartOfMaterials characterizationen_US
dcterms.issued2021-06-
dc.identifier.scopus2-s2.0-85104148015-
dc.identifier.artn111114en_US
dc.description.validate202210 bcfcen_US
dc.description.oaAccepted Manuscripten_US
dc.identifier.FolderNumberAP-0028-
dc.description.fundingSourceRGCen_US
dc.description.fundingSourceOthersen_US
dc.description.fundingTextThe National Natural Science Foundation of China; Guangdong Science and Technology Project-International Cooperation Project; The Hong Kong Scholars Programen_US
dc.description.pubStatusPublisheden_US
dc.identifier.OPUS50347741-
dc.description.oaCategoryGreen (AAM)en_US
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