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http://hdl.handle.net/10397/95038
| Title: | Solution process formation of high performance, stable nanostructured transparent metal electrodes via displacement-diffusion-etch process | Authors: | Zhang, Y Guo, X Huang, J Ren, Z Hu, H Li, P Lu, X Wu, Z Xiao, T Zhu, Y Li, G Zheng, Z |
Issue Date: | 2022 | Source: | NPJ flexible electronics, 2022, v. 6, no. 1, 4 | Abstract: | Transparent electrodes (TEs) with high chemical stability and excellent flexibility are critical for flexible optoelectronic devices, such as photodetectors, solar cells, and light-emitting diodes. Ultrathin metal electrode (thickness less than 20 nm) has bee+AD7n a promising TE candidate, but the fabrication can only be realized by vacuum-based technologies to date, and require tedious surface engineering of the substrates, which are neither ideal for polymeric based flexible applications nor suitable for roll-to-roll large-scale manufacture. This paper presents high-performance nanostructured transparent metal electrodes formation via displacement–diffusion-etch (DDE) process, which enables the solution-processed sub-20-nm-thick ultrathin gold electrodes (UTAuEs) on a wide variety of hard and soft substrates. UTAuEs fabricated on flexible polyethylene terephthalate (PET) substrates show a high chemical/environmental stability and superior bendability to commercial flexible indium–tin-oxide (ITO) electrodes. Moreover, flexible organic solar cells made with UTAuEs show similar power conversion efficiency but much enhanced flexibility, in comparison to that of ITO-based devices. | Publisher: | Springer Nature | Journal: | NPJ flexible electronics | EISSN: | 2397-4621 | DOI: | 10.1038/s41528-022-00134-2 | Rights: | © The Author(s) 2022 This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons license, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons license, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons license and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this license, visit http://creativecommons.org/licenses/by/4.0/. The following publication Zhang, Y., Guo, X., Huang, J. et al. Solution process formation of high performance, stable nanostructured transparent metal electrodes via displacement-diffusion-etch process. npj Flex Electron 6, 4 (2022) is available at https://doi.org/10.1038/s41528-022-00134-2. |
| Appears in Collections: | Journal/Magazine Article |
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| File | Description | Size | Format | |
|---|---|---|---|---|
| Zhang_Solution_process_formation.pdf | 5.51 MB | Adobe PDF | View/Open |
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