Please use this identifier to cite or link to this item:
PIRA download icon_1.1View/Download Full Text
Title: Printability of photo-sensitive nanocomposites using two-photon polymerization
Authors: Yeung, KW 
Dong, YQ 
Chen, L
Tang, CY 
Law, C 
Tsui, GRCP 
Engstrom, DS
Issue Date: 2020
Source: Nanotechnology reviews, 2020, v. 9, no. 1, p. 418-426
Abstract: Two-photon polymerization direct laser writing (TPP DLW) is an emerging technology for producing advanced functional devices with complex three-dimensional (3D) micro-structures. Tremendous efforts have been devoted to developing two-photon polymerizable photo-sensitive nanocomposites with tailored properties. Light-induced reconfigurable smart materials such as liquid crystalline elastomers (LCEs) are promising materials. However, due to the difficulties in designing two-photon polymerizable liquid crystal monomer (LCM) nanocomposite photoresists, it is challenging to fabricate true 3D LCE micro-structures. In this paper, we report the preparation of photo-sensitive LCE nanocomposites containing photothermal nanomaterials, including multiwalled carbon nanotubes, graphene oxide and gold nanorods (AuNRs), for TPP DLW. The printability of the LCE nanocomposites is assessed by the fidelity of the micro-structures under different laser writing conditions. DLW of GO/LCM photoresist has shown a vigorous bubble formation. This may be due to the excessive heat generation upon rapid energy absorption of 780 nm laser energy. Compared to pure LCM photoresists, AuNR/LCM photoresists have a lower laser intensity threshold and higher critical laser scanning speed, due to the high absorption of AuNRs at 780 nm, which enhanced the photo-sensitivity of the photoresist. Therefore, a shorter printing time can be achieved for the AuNR/LCM photoresist.
Keywords: Two-photon polymerization
Direct laser writing
3D nanofabrication
Photothermal nanomaterials
Publisher: Walter de Gruyter GmbH
Journal: Nanotechnology reviews 
ISSN: 2191-9089
EISSN: 2191-9097
DOI: 10.1515/ntrev-2020-0031
Rights: © 2020 Ka-Wai Yeung et al., published by De Gruyter. This work is licensed under the Creative Commons Attribution 4.0 International License. BY 4.0 (
The following publication Yeung, K. W., Dong, Y. Q., Chen, L., Tang, C. Y., Law, C., Tsui, G. R. C. P., & Engstrom, D. S. (2020). Printability of photo-sensitive nanocomposites using two-photon polymerization. Nanotechnology Reviews, 9(1), 418-426 is available at
Appears in Collections:Journal/Magazine Article

Files in This Item:
File Description SizeFormat 
Yeung_Printability_Photo-Sensitive_Nanocomposites.pdf1.38 MBAdobe PDFView/Open
Open Access Information
Status open access
File Version Version of Record
View full-text via PolyU eLinks SFX Query
Show full item record

Page views

Last Week
Last month
Citations as of Jun 4, 2023


Citations as of Jun 4, 2023


Citations as of Jun 8, 2023


Citations as of Jun 8, 2023

Google ScholarTM



Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.