Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/78959
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dc.contributorDepartment of Applied Physicsen_US
dc.creatorYau, HMen_US
dc.creatorXi, ZNen_US
dc.creatorChen, XXen_US
dc.creatorChan, CHen_US
dc.creatorWen, Zen_US
dc.creatorDai, JYen_US
dc.date.accessioned2018-10-26T01:21:53Z-
dc.date.available2018-10-26T01:21:53Z-
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://hdl.handle.net/10397/78959-
dc.language.isoenen_US
dc.publisherAmerican Institute of Physicsen_US
dc.rights© 2018 Author(s).en_US
dc.rightsThis article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in H. M. Yau et al., Appl. Phys. Lett. 113, 042905 (2018) and may be found at https://dx.doi.org/10.1063/1.5024449en_US
dc.titleFerroelectric-induced resistive switching in ultrathin (Ba,Sr)TiO3 tunnel junctions due to strain modulationen_US
dc.typeJournal/Magazine Articleen_US
dc.identifier.volume113en_US
dc.identifier.issue4en_US
dc.identifier.doi10.1063/1.5024449en_US
dcterms.abstractThrough strain modulation to the (Ba-0.8,Sr-0.2)TiO3 (BST) tunnel junction, giant resistive switching was achieved in a Pt/BST/Nb:SrTiO3 (Nb:STO) heterostructure, and the role of ferroelectricity in the resistive switching was studied. When an external compressive strain was added to this heterostructure with a ten-unit-cell-thick BST tunnel layer, the resistive switching mechanism was demonstrated to change from thermionic emission to direct tunneling accompanied by the ferroelectricity enhancement to the BST layer. This reveals the role of strain and ferroelectricity in resistive switching which leads to three orders increase in the ON/OFF current ratio for the BST tunnel layer. These encouraging results not only show the potential to enhance ferroelectricity of BST thin film by strain engineering, but also the crucial role of strain engineering in BST tunnel layer-based memory device applications. Published by AIP Publishing.en_US
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationApplied physics letters, 23 July 2018, v. 113, no. 4, 42905en_US
dcterms.isPartOfApplied physics lettersen_US
dcterms.issued2018-
dc.identifier.isiWOS:000440046600026-
dc.identifier.eissn1077-3118en_US
dc.identifier.artn42905en_US
dc.description.validate201810 bcrcen_US
dc.description.oaVersion of Recorden_US
dc.identifier.FolderNumberOA_IR/PIRAen_US
dc.description.pubStatusPublisheden_US
dc.description.oaCategoryVoR alloweden_US
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