Please use this identifier to cite or link to this item:
http://hdl.handle.net/10397/65598
| DC Field | Value | Language |
|---|---|---|
| dc.contributor | Department of Applied Physics | en_US |
| dc.creator | Yuan, S | en_US |
| dc.creator | Yang, Z | en_US |
| dc.creator | Xie, C | en_US |
| dc.creator | Yan, F | en_US |
| dc.creator | Dai, J | en_US |
| dc.creator | Lau, SP | en_US |
| dc.creator | Chan, HLW | en_US |
| dc.creator | Hao, J | en_US |
| dc.date.accessioned | 2017-05-22T02:08:54Z | - |
| dc.date.available | 2017-05-22T02:08:54Z | - |
| dc.identifier.issn | 0935-9648 | en_US |
| dc.identifier.uri | http://hdl.handle.net/10397/65598 | - |
| dc.language.iso | en | en_US |
| dc.publisher | Wiley-VCH | en_US |
| dc.rights | © 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim | en_US |
| dc.rights | This is the peer reviewed version of the following article: Yuan, S., Yang, Z., Xie, C., Yan, F., Dai, J., Lau, S. P., ... & Hao, J. (2016). Ferroelectric‐driven performance enhancement of graphene field‐effect transistors based on vertical tunneling heterostructures. Advanced Materials, 28(45), 10048-10054, which has been published in final form at https://doi.org/10.1002/adma.201601489. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Use of Self-Archived Versions. This article may not be enhanced, enriched or otherwise transformed into a derivative work, without express permission from Wiley or by statutory rights under applicable legislation. Copyright notices must not be removed, obscured or modified. The article must be linked to Wiley’s version of record on Wiley Online Library and any embedding, framing or otherwise making available the article or pages thereof by third parties from platforms, services and websites other than Wiley Online Library must be prohibited. | en_US |
| dc.subject | 2D materials | en_US |
| dc.subject | Ferroelectric thin films | en_US |
| dc.subject | Field-effect transistors | en_US |
| dc.subject | Graphene | en_US |
| dc.subject | Pulsed laser deposition | en_US |
| dc.title | Ferroelectric-driven performance enhancement of graphene field-effect transistors based on vertical tunneling heterostructures | en_US |
| dc.type | Journal/Magazine Article | en_US |
| dc.identifier.spage | 10048 | en_US |
| dc.identifier.epage | 10054 | en_US |
| dc.identifier.volume | 28 | en_US |
| dc.identifier.issue | 45 | en_US |
| dc.identifier.doi | 10.1002/adma.201601489 | en_US |
| dcterms.accessRights | open access | en_US |
| dcterms.bibliographicCitation | Advanced materials, 7 Dec. 2016, v. 28, no. 45, p. 10048-10054 | en_US |
| dcterms.isPartOf | Advanced materials | en_US |
| dcterms.issued | 2016-12-07 | - |
| dc.identifier.isi | WOS:000392725200017 | - |
| dc.identifier.scopus | 2-s2.0-84999751990 | - |
| dc.identifier.ros | 2016005791 | - |
| dc.identifier.eissn | 1521-4095 | en_US |
| dc.identifier.rosgroupid | 2016005538 | - |
| dc.description.ros | 2016-2017 > Academic research: refereed > Publication in refereed journal | en_US |
| dc.description.validate | 201804_a bcma | en_US |
| dc.description.oa | Accepted Manuscript | en_US |
| dc.identifier.FolderNumber | AP-0822 | - |
| dc.description.fundingSource | RGC | en_US |
| dc.description.fundingSource | Others | en_US |
| dc.description.fundingText | National Natural Science Foundation of China;The Hong Kong Polytechnic University; HKU/PolyU, HKUST Collaborative Research Fund | en_US |
| dc.description.pubStatus | Published | en_US |
| dc.identifier.OPUS | 6700714 | - |
| dc.description.oaCategory | Green (AAM) | en_US |
| Appears in Collections: | Journal/Magazine Article | |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| Yan_Ferroelectric-Driven_Performance_Enhancement.pdf | Pre-Published version | 1 MB | Adobe PDF | View/Open |
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