Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/4993
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dc.contributorDepartment of Applied Physics-
dc.creatorGao, F-
dc.creatorCai, C-
dc.creatorWang, Y-
dc.creatorDong, S-
dc.creatorQiu, XY-
dc.creatorYuan, GL-
dc.creatorLiu, ZG-
dc.creatorLiu, J-
dc.date.accessioned2014-12-11T08:24:58Z-
dc.date.available2014-12-11T08:24:58Z-
dc.identifier.issn0021-8979-
dc.identifier.urihttp://hdl.handle.net/10397/4993-
dc.language.isoenen_US
dc.publisherAmerican Institute of Physicsen_US
dc.rights© 2006 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in F. Gao et al., J. Appl. Phys. 99, 094105 (2006) and may be found at http://link.aip.org/link/?jap/99/094105.en_US
dc.subjectLanthanumen_US
dc.subjectBismuth compoundsen_US
dc.subjectFerroelectric thin filmsen_US
dc.subjectMagnetic thin filmsen_US
dc.subjectPulsed laser depositionen_US
dc.subjectDielectric polarisationen_US
dc.subjectMagnetisationen_US
dc.subjectFerromagnetic materialsen_US
dc.subjectMultiferroicsen_US
dc.titlePreparation of La-doped BiFeO₃thin films with Fe²⁺ ions on Si substratesen_US
dc.typeJournal/Magazine Articleen_US
dc.identifier.spage1-
dc.identifier.epage4-
dc.identifier.volume99-
dc.identifier.issue9-
dc.identifier.doi10.1063/1.2195368-
dcterms.abstractLa-doped BiFeO₃thin films with Fe²⁺ ions have been prepared on Pt/TiO₂/SiO₂/Si substrates by pulsed laser deposition in order to enhance the ferroelectric and magnetic properties. The targets for the film deposition were synthesized using a rapid liquid phase sintering technique to ensure the low leakage. The dielectric properties at room temperature and above were investigated. It was observed that the La doping greatly enhances the ferroelectric polarization at room temperature by modifying the film structure from rhombohedral to monoclinic. The saturation magnetization was enhanced about two times due to the Fe²⁺ ions in the thin films.-
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationJournal of applied physics, 1 May 2006, v. 99, no. 9, 094105, p. 1-4-
dcterms.isPartOfJournal of applied physics-
dcterms.issued2006-05-01-
dc.identifier.isiWOS:000237682900066-
dc.identifier.scopus2-s2.0-33646860379-
dc.identifier.eissn1089-7550-
dc.description.oaVersion of Recorden_US
dc.identifier.FolderNumberOA_IR/PIRAen_US
dc.description.pubStatusPublisheden_US
dc.description.oaCategoryVoR alloweden_US
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