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| Title: | Investigation of Ge nanocrytals in a metal-insulator-semiconductor structure with a HfO₂/SiO₂stack as the tunnel dielectric | Authors: | Wang, S Liu, WL Wan, Q Dai, J Lee, PF Luo, S Shen, Q Zhang, M Song, ZT Lin, C |
Issue Date: | 14-Mar-2005 | Source: | Applied physics letters, 14 Mar. 2005, v. 86, no. 11, 113105, p. 1-3 | Abstract: | A metal-insulator-semiconductor (MIS) structure containing a HfO₂control gate, a Ge nanocrystal-embedded HfO₂dielectric and a HfO₂/SiO₂stack layer as tunnel oxide, was fabricated by an electron-beam evaporation method. High-resolution transmission electron microscopy study revealed that the HfO₂/SiO₂stack layer minimized Ge penetration, leading to the formation of Ge nanocrystals that are self-aligned between the tunnel oxide and the capping HfO₂layer. Influence of different annealing conditions on the formation and distribution of Ge nanocrystals was studied. Current–voltage (I–V) and capacitance–voltage (C–V) measurements revealed promising electrical characteristics of the MIS structure, and relatively high stored charge density of 10¹² cm⁻² was achieved. | Keywords: | Hafnium compounds Germanium Silicon compounds Silicon Elemental semiconductors MIS structures Nanostructured materials Electron beam deposition Leakage currents Annealing Transmission electron microscopy Dielectric thin films Impurity distribution |
Publisher: | American Institute of Physics | Journal: | Applied physics letters | ISSN: | 0003-6951 | EISSN: | 1077-3118 | DOI: | 10.1063/1.1864254 | Rights: | © 2005 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in S. Wang et al., Appl. Phys. Lett. 86, 113105 (2005) and may be found at http://link.aip.org/link/?apl/86/113105 |
| Appears in Collections: | Journal/Magazine Article |
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