Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/437
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dc.contributorDepartment of Applied Physics-
dc.contributorMaterials Research Centre-
dc.creatorZhang, Yen_US
dc.creatorKe, Sen_US
dc.creatorHuang, Hen_US
dc.creatorZhao, Len_US
dc.creatorYu, Len_US
dc.creatorChan, HLWen_US
dc.date.accessioned2014-12-11T08:27:42Z-
dc.date.available2014-12-11T08:27:42Z-
dc.identifier.issn0003-6951en_US
dc.identifier.urihttp://hdl.handle.net/10397/437-
dc.language.isoenen_US
dc.publisherAmerican Institute of Physicsen_US
dc.rights© 2008 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. The following article appeared in Y. Zhang et al. Appl. Phys. Lett. 92, 052910 (2008) and may be found at http://link.aip.org/link/?apl/92/052910en_US
dc.subjectDielectric lossesen_US
dc.subjectDielectric relaxationen_US
dc.subjectDielectric thin filmsen_US
dc.subjectGlass transitionen_US
dc.subjectNanostructured materialsen_US
dc.subjectPermittivityen_US
dc.subjectPolymer filmsen_US
dc.subjectPolymer foamsen_US
dc.titleDielectric relaxation in polyimide nanofoamed films with low dielectric constanten_US
dc.typeJournal/Magazine Articleen_US
dc.identifier.spage1en_US
dc.identifier.epage3en_US
dc.identifier.volume92en_US
dc.identifier.doi10.1063/1.2840715en_US
dcterms.abstractPolyimide nanofoamed films have been prepared from the polyimide precursors (PMDA-ODA) and poly(ethylene oxide)(PEO) in N,N-dimethylacetamide. The dielectric properties of the films were studied over the temperature range of -150-150 °C and a frequency range of 1 Hz-10 MHz. The frequency dependence of the dielectric constant for nanofoamed films with different amounts of PEO was studied. An relaxation process at below the glass transition temperature of the polyimide nanofoamed films was found. The peak value of the dielectric loss increased with increasing amount of PEO.-
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationApplied physics letters, 8 May 2008, v. 92, 052910, p. 1-3en_US
dcterms.isPartOfApplied physics lettersen_US
dcterms.issued2008-02-08-
dc.identifier.isiWOS:000253016500063-
dc.identifier.scopus2-s2.0-38949135910-
dc.identifier.eissn1077-3118en_US
dc.identifier.rosgroupidr36938-
dc.description.ros2007-2008 > Academic research: refereed > Publication in refereed journal-
dc.description.oaVersion of Recorden_US
dc.identifier.FolderNumberOA_IR/PIRA-
dc.description.pubStatusPublisheden_US
dc.description.oaCategoryVoR alloweden_US
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