Study on the material removal mechanism of cemented carbide magnetic materials in magnetic field-assisted mass polishing

Abstract

Cemented carbides (WC-Co) are crucial in modern engineering due to their exceptional hardness, wear resistance, and toughness, making them ideal for various applications. Despite advancements in polishing techniques, the mechanisms for polishing WC-Co magnetic materials using magnetic field-assisted methods remain inadequately understood. This study addresses these gaps by investigating the material removal mechanism of WC-Co after electrical discharge machining (EDM) using the proposed magnetic field-assisted mass polishing (MAMP) method. A material removal distribution (MRD) model of different magnetic materials was developed to guide the experiments. Key findings include significant reductions in surface roughness, effective removal of oxide layers formed during EDM, and improved polishing uniformity and efficiency. The study also demonstrated the MAMP method's ability to maintain the form integrity of structured surfaces. This research enhances the understanding of polishing mechanisms for magnetic materials and presents a viable method for improving the surface quality of WC-Co. This research provides valuable insights into the polishing mechanisms of magnetic materials using magnetic field-assisted polishing methods.