Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/113723
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dc.contributorDepartment of Applied Physicsen_US
dc.creatorHu, Yen_US
dc.creatorWang, Xen_US
dc.creatorWang, Xen_US
dc.creatorGong, Yen_US
dc.creatorTang, Zen_US
dc.creatorZhao, Gen_US
dc.creatorYip, WHen_US
dc.creatorLiu, Jen_US
dc.creatorLim, SBen_US
dc.creatorBoutchich, Men_US
dc.creatorCoquet, Pen_US
dc.creatorLau, SPen_US
dc.creatorTay, BKen_US
dc.date.accessioned2025-06-19T06:23:29Z-
dc.date.available2025-06-19T06:23:29Z-
dc.identifier.urihttp://hdl.handle.net/10397/113723-
dc.language.isoenen_US
dc.publisherWiley-VCHen_US
dc.rights© 2025 The Author(s). Advanced Science published by Wiley-VCHGmbH. This is an open access article under the terms of the Creative Commons Attribution License (https://creativecommons.org/licenses/by/4.0/), which permits use, distribution andreproduction in any medium, provided the original work is properly cited.en_US
dc.rightsThe following publication Y. Hu, X. Wang, X. Wang, Y. Gong, Z. Tang, G. Zhao, W. H. Yip, J. Liu, S. B. Lim, M. Boutchich, P. Coquet, S. P. Lau, B. K. Tay, Interface-Enhanced and Self-Guided Growth of 2D Interlayer Heterostructure Wafers with Vertically Aligned Van Der Waals Layers. Adv. Sci. 2025, 12, 2412690 is available at https://doi.org/10.1002/advs.202412690.en_US
dc.subjectInterface-enhanced selenizationen_US
dc.subjectRectification effecten_US
dc.subjectSelf-guided growthen_US
dc.subjectSi-compatible integrationen_US
dc.subjectWafer-scale 2D heterostructureen_US
dc.titleInterface-enhanced and self-guided growth of 2D interlayer heterostructure wafers with vertically aligned Van Der Waals layersen_US
dc.typeJournal/Magazine Articleen_US
dc.identifier.volume12en_US
dc.identifier.issue14en_US
dc.identifier.doi10.1002/advs.202412690en_US
dcterms.abstract2D heterostructures have garnered significant interest in the scientific community owing to their exceptional carrier transport properties and tunable band alignment. The fabrication of these heterostructures on a wafer scale is crucial for advancing industrial applications but remains particularly challenging for metals with low sulfidation activity, such as Hf. Herein, the one-pot method is developed for fabricating wafer-scale HfSe2/WSe2 interlayer heterostructures with vertically aligned van der Waals layers via interface-enhanced selenization and self-guided growth. By depositing a W layer (high sulfidation activity) over a Hf layer, followed by a one-pot selenization process, the chemical combination between Hf and Se atoms is enhanced through interfacial Se diffusion and confined lattice reaction. Moreover, the WSe2 layers grow perpendicular to the substrate and further guide the crystallization of the bottom HfSe2 layers. The resulting heterostructures, characterized by covalent bonds, demonstrate significant charge transfer, enhanced piezoelectricity, notable rectification effects, and Si-compatible transistor integration. This interface-enhanced selenization and self-guided growth pathway may provide valuable insights into the fabrication of covalently connected interlayer heterostructures involving metals with low sulfidation activity, as well as the development of high-density integrated circuits.en_US
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationAdvanced science, 10 Apr., 2025, v. 12, no. 14, 2412690en_US
dcterms.isPartOfAdvanced scienceen_US
dcterms.issued2025-04-10-
dc.identifier.scopus2-s2.0-105002263148-
dc.identifier.pmid39960840-
dc.identifier.eissn2198-3844en_US
dc.identifier.artn2412690en_US
dc.description.validate202506 bchyen_US
dc.description.oaVersion of Recorden_US
dc.identifier.FolderNumbera3751-
dc.identifier.SubFormID50937-
dc.description.fundingSourceRGCen_US
dc.description.fundingSourceOthersen_US
dc.description.pubStatusPublisheden_US
dc.description.oaCategoryCCen_US
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