Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/112579
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dc.contributorDepartment of Applied Biology and Chemical Technologyen_US
dc.contributorResearch Institute for Smart Energyen_US
dc.contributorMainland Development Officeen_US
dc.creatorZhang, Jen_US
dc.creatorChen, Yen_US
dc.creatorLi, Gen_US
dc.creatorSun, Zen_US
dc.creatorMeng, Zen_US
dc.creatorWong, WYen_US
dc.date.accessioned2025-04-17T06:34:39Z-
dc.date.available2025-04-17T06:34:39Z-
dc.identifier.issn1674-7291en_US
dc.identifier.urihttp://hdl.handle.net/10397/112579-
dc.language.isoenen_US
dc.publisherScience in China Pressen_US
dc.rights© The Author(s) 2025. This article is published with open access at link.springer.com.en_US
dc.rightsThis article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/.en_US
dc.rightsThe following publication Zhang, J., Chen, Y., Li, G. et al. Nanoimprint lithography-assisted block copolymer self-assembly for hyperfine fabrication of magnetic patterns based on L10-FePt nanoparticles. Sci. China Chem. 68, 2027–2034 (2025) is available at https://doi.org/10.1007/s11426-024-2333-x.en_US
dc.subjectBlock copolymer self-assemblyen_US
dc.subjectMagnetic nanoparticlesen_US
dc.subjectNanoimprint lithographyen_US
dc.subjectOrganometallic precursoren_US
dc.titleNanoimprint lithography-assisted block copolymer self-assembly for hyperfine fabrication of magnetic patterns based on L1₀-FePt nanoparticlesen_US
dc.typeJournal/Magazine Articleen_US
dc.identifier.spage2027en_US
dc.identifier.epage2034en_US
dc.identifier.volume68en_US
dc.identifier.issue5en_US
dc.identifier.doi10.1007/s11426-024-2333-xen_US
dcterms.abstractL10-FePt-type bit-patterned media has provided a promising alternative for ultrahigh-density magnetic recording systems in the current digital era, but rapid fabrication of magnetic patterns with hyperfine bit islands is still challenging, especially with the target for miniaturization and scalable production simultaneously. Herein, Fe,Pt-containing block copolymers were utilized as single-source precursors for solution-processable patterning and subsequent generation of the demanding magnetic FePt dots by in situ pyrolysis. High-throughput nanoimprint lithography was initially employed to fabricate the predefined bit cells precisely, and then the intrinsic self-assembly of phase-separated block copolymers further drove the formation of accurate bit islands. Benefiting from the synergistic effect of top-down lithographic approach and bottom-up self-assembly, the customizable patterns could be achieved for large-scale mass production in targeted areas, but high-density isolated dots could also be accurately aligned along the patterned features after subsequent self-assembly. This reliable strategy would provide a good avenue to precisely construct ultrahigh-density magnetic data storage devices.en_US
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationScience China : chemistry, May 2025, v. 68, no. 5, p. 2027-2034en_US
dcterms.isPartOfScience China : chemistryen_US
dcterms.issued2025-05-
dc.identifier.scopus2-s2.0-85217268257-
dc.identifier.eissn1869-1870en_US
dc.description.validate202504 bcchen_US
dc.description.oaVersion of Recorden_US
dc.identifier.FolderNumberOA_TA-
dc.description.fundingSourceRGCen_US
dc.description.fundingSourceOthersen_US
dc.description.fundingTextNational Key R&D Program of China (2022YFE0104100); National Natural Science Foundation of China (52073242, 22075184, and 22271153); Guangdong-Hong Kong-Macao Joint Laboratory of Optoelectronic and Magnetic Functional Materials (2019B121205002); Research Centre for Nanoscience and Nanotechnology (CE2H); PolyU Shenzhen Research Institute (J2023A006); Miss Clarea Au for the Endowed Professorship in Energy (847S)en_US
dc.description.pubStatusPublisheden_US
dc.description.TASpringer Nature (2024)en_US
dc.description.oaCategoryTAen_US
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