Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/109028
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dc.contributorDepartment of Electrical and Electronic Engineeringen_US
dc.contributorResearch Institute for Smart Energyen_US
dc.contributorPhotonics Research Instituteen_US
dc.contributorDepartment of Applied Physicsen_US
dc.creatorXie, Xen_US
dc.creatorMa, Ren_US
dc.creatorLuo, Yen_US
dc.creatorDela Peña, TAen_US
dc.creatorFong, PWKen_US
dc.creatorLuo, Den_US
dc.creatorChandran, HTen_US
dc.creatorJia, Ten_US
dc.creatorLi, Men_US
dc.creatorWu, Jen_US
dc.creatorKyaw, AKKen_US
dc.creatorLi, Gen_US
dc.date.accessioned2024-09-13T07:19:57Z-
dc.date.available2024-09-13T07:19:57Z-
dc.identifier.issn1614-6832en_US
dc.identifier.urihttp://hdl.handle.net/10397/109028-
dc.language.isoenen_US
dc.publisherWiley-VCH Verlag GmbH & Co. KGaAen_US
dc.rights© 2024 The Author(s). Advanced Energy Materials published byWiley-VCH GmbH. This is an open access article under the terms of theCreative Commons Attribution License (http://creativecommons.org/licenses/by/4.0/), which permits use, distributionand reproduction in any medium, provided the original work is properlycited.en_US
dc.rightsThe following publication X. Xie, R. Ma, Y. Luo, T. A. Dela Peña, P. W.-K. Fong, D. Luo, H. T. Chandran, T. Jia, M. Li, J. Wu, A. K. K. Kyaw, G. Li, Thickness Insensitive Organic Solar Cells with High Figure-of-Merit-X Enabled by Simultaneous D/A Interpenetration and Stratification. Adv. Energy Mater. 2024, 2401355 is available at https://doi.org/10.1002/aenm.202401355.en_US
dc.subjectNonfused ring acceptoren_US
dc.subjectOrganic solar cellsen_US
dc.subjectPower conversion efficiencyen_US
dc.subjectSequential depositionen_US
dc.subjectThick filmen_US
dc.titleThickness insensitive organic solar cells with high figure-of-merit-X enabled by simultaneous D/A interpenetration and stratificationen_US
dc.typeJournal/Magazine Articleen_US
dc.identifier.doi10.1002/aenm.202401355en_US
dcterms.abstractLow cost and printing friendly fabrication of organic solar cells (OSCs) require thick-film devices with simply structured photoactive molecules. Thus, achieving high power conversion efficiency (PCE) for non-fused ring acceptor-based devices with high thickness is of great significance. Herein, by transforming traditional blend casting method to emerging sequential deposition (SD) method, D18:A4T-16 active blend exhibits large efficiency improvement from 8.02% to 14.75% in 300 nm thick devices. Systematic morphological and photophysical characterizations showcase the effectiveness of SD processing in achieving sufficient donor/acceptor interpenetration and vertical stratification, which eliminates the dilemma of charge generation/transport in blend casting films. Meanwhile, D18 bottom layer is proven helpful in realizing fast evaporation of postdeposited poor solvent, resulting in naturally thickened active layer with well-regulated crystallization. Furthermore, a new index to emphasize thick-film devices based on nonfused ring acceptors, called figure-of-merit-X (FoM-X), has been defined. The SD processed D18:A4T-16 devices herein, with 300 nm, 500 nm, and 800 nm thicknesses possess leading FoM-X values.en_US
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationAdvanced energy materials, First published: 14 June 2024, Early View, 2401355, https://doi.org/10.1002/aenm.202401355en_US
dcterms.isPartOfAdvanced energy materialsen_US
dcterms.issued2024-
dc.identifier.scopus2-s2.0-85195858845-
dc.identifier.eissn1614-6840en_US
dc.identifier.artn2401355en_US
dc.description.validate202409 bcchen_US
dc.description.oaVersion of Recorden_US
dc.identifier.FolderNumberOA_TA-
dc.description.fundingSourceRGCen_US
dc.description.fundingSourceOthersen_US
dc.description.fundingTextShenzhen Science and Technology Innovation Commission; Hong Kong Polytechnic University: Sir Sze-yuen Chung Endowed Professorship Fund; RISE; PRI; Guangdong-Hong Kong-Macao Joint Laboratory for Photonic-Thermal-Electrical Energy Materials and Devices; PolyU Distinguished Postdoctoral Fellowship; Natural Science Foundation of Guangdong Province; National Natural Science Foundation of China; Guangdong government; Guangzhou government; Guangzhou Municipal Science and Technology Project; HKUST Materials Characterization and Preparation Facility Guangzhouen_US
dc.description.pubStatusEarly releaseen_US
dc.description.TAWiley (2024)en_US
dc.description.oaCategoryTAen_US
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