Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/107051
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dc.contributorDepartment of Aeronautical and Aviation Engineeringen_US
dc.creatorYang, Zen_US
dc.creatorChen Yen_US
dc.creatorZou, Fen_US
dc.creatorCegla, FBen_US
dc.date.accessioned2024-06-11T08:09:56Z-
dc.date.available2024-06-11T08:09:56Z-
dc.identifier.issn2196-0216en_US
dc.identifier.urihttp://hdl.handle.net/10397/107051-
dc.language.isoenen_US
dc.publisherWiley-VCHen_US
dc.rights© 2024 The Authors. ChemElectroChem published by Wiley-VCH GmbH. Thisis an open access article under the terms of the Creative Commons Attribution License (https://creativecommons.org/licenses/by/4.0/), which permits use, distribution and reproduction in anymedium, provided the original work is properly cited.en_US
dc.rightsThe following publication Zirui, C. Yunda, F. Zou, F. B. Cegla, ChemElectroChem 2024, 11, e202400164 is available at https://doi.org/10.1002/celc.202400164.en_US
dc.subjectAnalytical methodsen_US
dc.subjectElectrodepositionen_US
dc.subjectSurface analysisen_US
dc.subjectUltrasonic testingen_US
dc.subjectZinc platingen_US
dc.titleAn immersion ultrasonic testing-based research platform for studying electroplating kineticsen_US
dc.typeJournal/Magazine Articleen_US
dc.identifier.volume11en_US
dc.identifier.issue11en_US
dc.identifier.doi10.1002/celc.202400164en_US
dcterms.abstractElectroplating is widely exploited in numerous application areas. Understanding the kinetics of electroplating, which is essentially a dynamic phenomenon, is crucial to making use of it appropriately in the real world. Currently, there exist a variety of research tools for studying electroplating kinetics, each with its own pros and cons. In this paper, we introduce a novel, immersion ultrasonic testing-based technique that carries out in situ, direct monitoring of the thickness increase of an electroplated layer. Through careful design and optimization of the measurement setup and the signal processing protocol, the measurement resolution of the technique was able to reach a sub-micron level. Via a number of demonstrative zinc plating experiments that were performed under different conditions, the measurement accuracy of the technique was thoroughly validated by a number of independent methods. All in all, the technique can become a promising alternative tool for studying the kinetics of different electroplating processes, supplementing the existing toolbox with the capability of providing a new class of information.en_US
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationChemElectroChem, 3 June, 2024, v. 11, no. 11, e202400164en_US
dcterms.isPartOfChemElectroChemen_US
dcterms.issued2024-06-03-
dc.identifier.scopus2-s2.0-85189988016-
dc.identifier.artne202400164en_US
dc.description.validate202406 bcwhen_US
dc.description.oaVersion of Recorden_US
dc.identifier.FolderNumberOA_TA-
dc.description.fundingSourceOthersen_US
dc.description.fundingTextNational Natural Science Foundation of China; the Department of Science and Technology of Guangdong Provinceen_US
dc.description.pubStatusPublisheden_US
dc.description.TAWiley (2024)en_US
dc.description.oaCategoryTAen_US
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