Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/100442
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dc.contributorDepartment of Applied Physicsen_US
dc.creatorZhou, Jen_US
dc.creatorJing, Xen_US
dc.creatorAlexe, Men_US
dc.creatorDai, Jen_US
dc.creatorQin, Men_US
dc.creatorWu, Sen_US
dc.creatorZeng, Men_US
dc.creatorGao, Jen_US
dc.creatorLu, Xen_US
dc.creatorLiu, JMen_US
dc.date.accessioned2023-08-08T01:56:13Z-
dc.date.available2023-08-08T01:56:13Z-
dc.identifier.issn0022-3727en_US
dc.identifier.urihttp://hdl.handle.net/10397/100442-
dc.language.isoenen_US
dc.publisherInstitute of Physics Publishingen_US
dc.rights© 2016 IOP Publishing Ltden_US
dc.rightsThis is the Accepted Manuscript version of an article accepted for publication in Journal of physics. D, Applied physics. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at https://doi.org/10.1088/0022-3727/49/17/175302.en_US
dc.rightsThis manuscript version is made available under the CC-BY-NC-ND 4.0 license (https://creativecommons.org/licenses/by-nc-nd/4.0/).en_US
dc.subjectBaTiO3en_US
dc.subjectCarrier mobilityen_US
dc.subjectCharge transporten_US
dc.subjectConductivityen_US
dc.subjectMicrostructure defectsen_US
dc.titleMicrostructure defects mediated charge transport in Nb-doped epitaxial BaTiO₃ thin filmsen_US
dc.typeJournal/Magazine Articleen_US
dc.identifier.volume49en_US
dc.identifier.issue17en_US
dc.identifier.doi10.1088/0022-3727/49/17/175302en_US
dcterms.abstractNb-doped BaTiO₃ (BNTO) films were deposited on MgO substrates at different substrate temperatures by pulsed laser deposition. The temperature dependence of their resistivity, carrier mobility and carrier concentration were systematically investigated. It reveals that the BNTO films deposited at lower temperature show higher resistivity and lower carrier mobility, and only show semiconductor characteristics at measurement temperatures ranging from 10 to 400 K. There is a metal-semiconductor transition at about 20 K for the films grown at relatively higher temperature. The intrinsic mechanism responsible for the different charge transport behavior was revealed by microstructure studies. Low crystal quality and high density of microstructure defects, observed for BNTO films grown at low temperatures, are, in particular, massively affecting the charge transport behavior of the BNTO films. The mediated charge transport of the microstructure defects is dominated by the thermal excitation process.en_US
dcterms.accessRightsopen accessen_US
dcterms.bibliographicCitationJournal of physics. D, Applied physics, 5 May 2016, v. 49, no. 17, 175302en_US
dcterms.isPartOfJournal of physics. D, Applied physicsen_US
dcterms.issued2016-05-05-
dc.identifier.scopus2-s2.0-84963543156-
dc.identifier.eissn1361-6463en_US
dc.identifier.artn175302en_US
dc.description.validate202308 bcvcen_US
dc.description.oaAccepted Manuscripten_US
dc.identifier.FolderNumberAP-0793-
dc.description.fundingSourceOthersen_US
dc.description.fundingTextThe National Natural Science Foundation of China; The program for Changjiang Scholars; Innovative Research Team in University; The Hong Kong Polytechnic Universityen_US
dc.description.pubStatusPublisheden_US
dc.identifier.OPUS6634276-
dc.description.oaCategoryGreen (AAM)en_US
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