Please use this identifier to cite or link to this item:
http://hdl.handle.net/10397/96661
| Title: | Material removal method, control system, fluid jet polishing system and storage medium | Other Title: | 材料去除方法、控制系统、流体喷射抛光系统及存储介质 | Authors: | Cheung, CF Wang, C Liu, M Ho, LT |
Issue Date: | 26-Oct-2021 | Source: | 中国专利 ZL 201810300885.5 | Publisher: | 中华人民共和国国家知识产权局 | Rights: | Assignee: 香港理工大学 |
| Appears in Collections: | Patent |
Files in This Item:
| File | Description | Size | Format | |
|---|---|---|---|---|
| ZL201810300885.5.PDF | 1.21 MB | Adobe PDF | View/Open |
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