Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/96661
PIRA download icon_1.1View/Download Full Text
DC FieldValueLanguage
dc.contributorDepartment of Industrial and Systems Engineering-
dc.creatorCheung, CF-
dc.creatorWang, C-
dc.creatorLiu, M-
dc.creatorHo, LT-
dc.date.accessioned2022-12-14T01:10:55Z-
dc.date.available2022-12-14T01:10:55Z-
dc.identifier.urihttp://hdl.handle.net/10397/96661-
dc.language.isozhen_US
dc.publisher中华人民共和国国家知识产权局en_US
dc.rightsAssignee: 香港理工大学en_US
dc.titleMaterial removal method, control system, fluid jet polishing system and storage mediumen_US
dc.typePatenten_US
dc.description.otherinformationInventor name used in this publication: 张志辉en_US
dc.description.otherinformationInventor name used in this publication: 王春锦en_US
dc.description.otherinformationInventor name used in this publication: 刘明宇en_US
dc.description.otherinformationInventor name used in this publication: 何丽婷en_US
dc.description.otherinformationTitle in Traditional Chinese: 材料去除方法、控制系統、流體噴射拋光系統及存儲介質en_US
dcterms.accessRightsopen accessen_US
dcterms.alternative材料去除方法、控制系统、流体喷射抛光系统及存储介质-
dcterms.bibliographicCitation中国专利 ZL 201810300885.5-
dcterms.issued2021-10-26-
dc.description.countryChina-
dc.description.validate202212 bcch-
dc.description.oaVersion of Recorden_US
Appears in Collections:Patent
Files in This Item:
File Description SizeFormat 
ZL201810300885.5.PDF1.21 MBAdobe PDFView/Open
Open Access Information
Status open access
File Version Version of Record
Show simple item record

Page views

44
Citations as of May 19, 2024

Downloads

18
Citations as of May 19, 2024

Google ScholarTM

Check


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.