Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/95699
PIRA download icon_1.1View/Download Full Text
Title: Redox photochemistry on van der Waals surfaces for reversible doping in 2d materials
Authors: Huang, L
Yang, T
Wong, LW 
Zheng, F 
Chen, X
Lai, KH 
Liu, H
Thi, QH
Shen, D
Lee, CS
Deng, Q
Zhao, J 
Ly, TH
Issue Date: 15-Apr-2021
Source: Advanced functional materials, 15 Apr. 2021, v. 31, no. 16, 2009166
Abstract: Despite the van der Waals (vdW) surfaces are usually chemically inert, un-destructive, scalable, and reversible redox reactions are introduced on the vdW surfaces of 2D anisotropic semiconductors ReX2 (X = S or Se) facilitated by simple photochemistry. Ultraviolet (UV) light (with humid) and laser exposure can reversibly oxidize and reduce rhenium disulfide (ReS2) and rhenium diselenide (ReSe2), respectively, yielding a pronounced doping effect with good control. Evidenced by Raman spectroscopy, dynamic force microscopy, transmission electron microscopy, and X-ray photoelectron spectroscopy, the grafting and removal of covalently functionalized oxygen groups on the perfect vdW surfaces are confirmed. The optical and electrical properties can be thereby reversibly tunable in wide ranges. Such optical direct-writing and rewritable capability via solvent/contaminant-free approach for chemical doping are compelling in the coming era of 2D materials.
Keywords: 2D materials
Anisotropic
Photochemistry
Redox
Reversible doping
Publisher: Wiley-VCH
Journal: Advanced functional materials 
ISSN: 1616-301X
EISSN: 1616-3028
DOI: 10.1002/adfm.202009166
Rights: © 2021 Wiley-VCH GmbH
This is the peer reviewed version of the following article: Huang, L., Yang, T., Wong, L. W., Zheng, F., Chen, X., Lai, K. H., ... & Ly, T. H. (2021). Redox photochemistry on van der Waals surfaces for reversible doping in 2D materials. Advanced Functional Materials, 31(16), 2009166, which has been published in final form at https://doi.org/10.1002/adfm.202009166. This article may be used for non-commercial purposes in accordance with Wiley Terms and Conditions for Use of Self-Archived Versions. This article may not be enhanced, enriched or otherwise transformed into a derivative work, without express permission from Wiley or by statutory rights under applicable legislation. Copyright notices must not be removed, obscured or modified. The article must be linked to Wiley’s version of record on Wiley Online Library and any embedding, framing or otherwise making available the article or pages thereof by third parties from platforms, services and websites other than Wiley Online Library must be prohibited.
Appears in Collections:Journal/Magazine Article

Files in This Item:
File Description SizeFormat 
Wong_Redox_Photochemistry_Van.pdfPre-Published version3.08 MBAdobe PDFView/Open
Open Access Information
Status open access
File Version Final Accepted Manuscript
Access
View full-text via PolyU eLinks SFX Query
Show full item record

Page views

80
Last Week
0
Last month
Citations as of Sep 22, 2024

Downloads

73
Citations as of Sep 22, 2024

SCOPUSTM   
Citations

12
Citations as of Sep 26, 2024

WEB OF SCIENCETM
Citations

12
Citations as of Sep 26, 2024

Google ScholarTM

Check

Altmetric


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.