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Title: Process institutionalisation crowds out innovativeness? An empirical analysis on the relationships between ISO 9000 adoption and R&D expenditure
Authors: Yiu, LMD
Lam, HKS
Yeung, ACL 
Issue Date: 2021
Source: International journal of productivity and quality management, 2021, v. 34, no. 2, p. 241-265
Abstract: Much research from an organisational perspective suggests that process certifications such as ISO 9000 constrain firms' explorative capability, crowding out research and development (R&D) activities. Yet, from an operations management (OM) perspective, process certifications like ISO 9000 should provide a well-established system, strengthening firms' capabilities for both exploration and exploitation. In this research, we examine the impact of ISO 9000 certifications on R&D expenditure of firms and investigate how such an impact is moderated by different operating environments. We find that firms actually increase their R&D expenditure after ISO 9000 certifications. Our results further indicate that ISO 9000-certified firms are more responsive to the changing operating environments for their R&D investments. ISO 9000 certifications reduce R&D expenses more swiftly under turbulence but expand more significantly with operational slack. Our research indicates that ISO 9000-certified firms seem to be more responsive to external environments in controlling their R&D expenditure.
Keywords: R&D expenditure
Recession
Market fluctuation
Operational slack
ISO 9000
Publisher: Inderscience Publishers
Journal: International journal of productivity and quality management 
ISSN: 1746-6474
EISSN: 1746-6482
DOI: 10.1504/IJPQM.2020.10037449
Rights: © 2021 Inderscience Enterprises Ltd.
This is the accepted manuscript of the following article: Process institutionalisation crowds out innovativeness? An empirical analysis on the relationships between ISO 9000 adoption and R&D expenditure. L.M. Daphne Yiu, Hugo K.S. Lam, and Andy C.L. Yeung. International Journal of Productivity and Quality Management 2021 34:2, 241-265, which has been published in final form at https://doi.org/10.1504/IJPQM.2020.10037449
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