Please use this identifier to cite or link to this item:
http://hdl.handle.net/10397/92416
Title: | Development of a fluid line-jet polishing process for rotational axisymmetric surfaces | Authors: | Wang, CJ Cheung, CF Ho, LT Loh, YM |
Issue Date: | Jan-2021 | Source: | Journal of manufacturing processes, Jan. 2021, v. 61, p. 15-24 | Abstract: | In this paper, a fluid line-jet polishing (FLJP) process was developed for the polishing of rotational axisymmetric surface (RAS). FLJP aims to enhance the polishing efficiency of fluid jet polishing without degrading the polished surface integrity, together with better material removal uniformity than linear-array multi-jet polishing (MJP). The fluid field was analyzed by comparing to the normal fluid jet polishing (FJP) based on computational fluid dynamics (CFD) method so as to test the stability of the fluid line-jet. A series of polishing experiments were conducted to analyze the performance of the FLJP and compared to FJP and MJP in terms of material removal characteristics, the effect of the main factors (i.e. fluid pressure, stand-off distance, etc.), material removal uniformity and surface quality after polishing on cylindrical surfaces. The results indicate that FLJP has much higher material removal rate than FJP under the same polishing conditions together with superior surface quality. The material removal after FLJP is much more uniform than MJP, especially at the region along the length direction of the line orifice. Moreover, it is also found that the relationship between the polishing factors and the material removal rate in FLJP is similar to FJP, resulting in good control of material removal. | Keywords: | Abrasive water jet Computational fluid dynamics Fluid jet polishing Revolving surface Roller surface Ultra-precision machining |
Publisher: | Elsevier Ltd | Journal: | Journal of manufacturing processes | ISSN: | 1526-6125 | EISSN: | 2212-4616 | DOI: | 10.1016/j.jmapro.2020.10.069 | Rights: | © 2020 The Society of Manufacturing Engineers. Published by Elsevier Ltd. All rights reserved. © 2020. This manuscript version is made available under the CC-BY-NC-ND 4.0 license http://creativecommons.org/licenses/by-nc-nd/4.0/. The following publication Wang, C. J., Cheung, C. F., Ho, L. T., & Loh, Y. M. (2021). Development of a fluid line-jet polishing process for rotational axisymmetric surfaces. Journal of Manufacturing Processes, 61, 15-24 is available at https://dx.doi.org/10.1016/j.jmapro.2020.10.069. |
Appears in Collections: | Journal/Magazine Article |
Files in This Item:
File | Description | Size | Format | |
---|---|---|---|---|
Wang_Development_Fluid_Line-jet.pdf | Pre-Published version | 3.27 MB | Adobe PDF | View/Open |
Page views
60
Last Week
0
0
Last month
Citations as of Apr 28, 2024
Downloads
64
Citations as of Apr 28, 2024
SCOPUSTM
Citations
17
Citations as of Apr 26, 2024
WEB OF SCIENCETM
Citations
13
Citations as of Apr 25, 2024
Google ScholarTM
Check
Altmetric
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.