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Title: Nanoimprint lithography-directed self-assembly of bimetallic Iron–M (M=Palladium, Platinum) complexes for magnetic patterning
Authors: Meng, Z
Li, G 
Yiu, SC 
Zhu, N
Yu, ZQ
Leung, CW 
Manners, I
Wong, WY 
Issue Date: 6-Jul-2020
Source: Angewandte chemie international edition, 6 July 2020, v. 59, no. 28, p. 11521-11526
Abstract: Self-assembly of d8 metal polypyridine systems is a well-established approach for the creation of 1D organometallic assemblies but there are still challenges for the large-scale construction of nanostructured patterns from these building blocks. We describe herein the use of high-throughput nanoimprint lithography (NIL) to direct the self-assembly of the bimetallic complexes [4′-ferrocenyl-(2,2′:6′,2′′-terpyridine)M(OAc)]+(OAc)− (M=Pd or Pt; OAc=acetate). Uniform nanorods are fabricated from the molecular self-organization and evidenced by morphological characterization. More importantly, when top-down NIL is coupled with the bottom-up self-assembly of the organometallic building blocks, regular arrays of nanorods can be accessed and the patterns can be controlled by changing the lithographic stamp, where the mold imposes a confinement effect on the nanorod growth. In addition, patterns consisting of the products formed after pyrolysis are studied. The resulting arrays of ferromagnetic FeM alloy nanorods suggest promising potential for the scalable production of ordered magnetic arrays and fabrication of magnetic bit-patterned media.
Keywords: Bimetallic complexes
Magnetic nanoparticles
Nanoimprint lithography
Nanorods
Self-assembly
Publisher: Wiley-VCH
Journal: Angewandte chemie international edition 
ISSN: 1433-7851
EISSN: 1521-3773
DOI: 10.1002/anie.202002685
Rights: © 2020 Wiley-VCH Verlag GmbH &Co. KGaA, Weinheim
This is the accepted version of the following article: Z. Meng, G. Li, S.-C. Yiu, N. Zhu, Z.-Q. Yu, C.-W. Leung, I. Manners, W.-Y. Wong, Angew. Chem. Int. Ed. 2020, 59, 11521, which has been published in final form at https://doi.org/10.1002/anie.202002685. This article may be used for non-commercial purposes in accordance with the Wiley Self-Archiving Policy [https://authorservices.wiley.com/author-resources/Journal-Authors/licensing/self-archiving.html]
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