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http://hdl.handle.net/10397/88731
Title: | Interstitial copper-doped edge contact for n-type carrier transport in black phosphorus | Authors: | Lin, ZY Wang, JL Guo, XY Chen, JW Xu, C Liu, MQ Liu, BL Zhu, Y Chai, Y |
Issue Date: | Jun-2019 | Source: | Infomat, June 2019, , v. 1, no. 2, p. 242-250 | Abstract: | Black phosphorus (BP) has been shown as a promising two-dimensional (2D) material for electronic devices owing to its high carrier mobility. To realize complementary electronic circuits with 2D materials, it is important to fabricate both n-type and p-type transistors with the same channel material. By engineering the contact region with copper (Cu)-doped BP, here we demonstrate an n-type carrier transport in BP field-effect transistors (FETs), which usually exhibit strongly p-type characteristics. Cu metal atoms are found to severely penetrate into the BP flakes, which forms interstitial Cu (Cu-int)-doped edge contact and facilitates the electron transport in BP. Our BP FETs in back-gated configuration exhibit n-type dominant characteristics with a high electron mobility of similar to 138 cm(2) V-1 s(-1) at room temperature. The Schottky barrier height for electrons is relatively low because of the edge contact between Cu-int-doped BP and pristine BP channel. The contact doping of BP by highly mobile Cu atoms gives rise to n-type transport property of BP FETs. Furthermore, we demonstrate a p-n junction on the same BP flake with asymmetric contact. This strategy on contact engineering can be further extended to other 2D materials. | Keywords: | Black phosphorus (BP) Carrier type Contact Doping Two-dimensional (2D) materials |
Publisher: | Wiley-VCH | Journal: | Infomat | EISSN: | 2567-3165 | DOI: | 10.1002/inf2.12015 | Rights: | © 2019 The Authors. InfoMat published by John Wiley & Sons Australia, Ltd on behalf of UESTC. This is an open access article under the terms of the Creative Commons Attribution License (https://creativecommons.org/licenses/by/4.0/), which permits use, distribution and reproduction in any medium, provided the original work is properly cited. The following publication Lin, Z, Wang, J, Guo, X, et al. Interstitial copper‐doped edge contact for n‐type carrier transport in black phosphorus. InfoMat. 2019; 1: 242– 250 is available at https://dx.doi.org/10.1002/inf2.12015 |
Appears in Collections: | Journal/Magazine Article |
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