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http://hdl.handle.net/10397/68486
Title: | Composite tip array for polymer pen lithography | Authors: | Zheng, ZJ Shen, YD Zhou, XC Zhuang, X |
Issue Date: | 14-Jul-2015 | Source: | US Patent 9,079,338 B2. Washington, DC: US Patent and Trademark Office, 2015. | Abstract: | A method of preparing a tip for lithography, includes forming a mold having at least one recess; disposing a first polymer in the recess to form an apex of the tip,; curing the first polymer in the recess; and disposing a second polymer in the recess to form a base of the tip. The Young's Modulus of the second polymer is lower than the Young's Modulus of the first polymer. The tip structure for lithography includes a substrate, and a layered structure including a tip having an apex of a first polymer and a base of a second polymer. The first polymer is less resiliently deformable than the second polymer. | Rights: | Assignee: The Hong Kong Polytechnic Univeristy. |
Appears in Collections: | Patent |
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us9079338b2.pdf | 3.76 MB | Adobe PDF | View/Open |
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