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Title: Composite tip array for polymer pen lithography
Authors: Zheng, ZJ 
Shen, YD 
Zhou, XC 
Zhuang, X
Issue Date: 14-Jul-2015
Source: US Patent 9,079,338 B2. Washington, DC: US Patent and Trademark Office, 2015. How to cite?
Abstract: A method of preparing a tip for lithography, includes forming a mold having at least one recess; disposing a first polymer in the recess to form an apex of the tip,; curing the first polymer in the recess; and disposing a second polymer in the recess to form a base of the tip. The Young's Modulus of the second polymer is lower than the Young's Modulus of the first polymer. The tip structure for lithography includes a substrate, and a layered structure including a tip having an apex of a first polymer and a base of a second polymer. The first polymer is less resiliently deformable than the second polymer.
Rights: Assignee: The Hong Kong Polytechnic Univeristy.
Appears in Collections:Patent

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