Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/68486
PIRA download icon_1.1View/Download Full Text
Title: Composite tip array for polymer pen lithography
Authors: Zheng, ZJ 
Shen, YD 
Zhou, XC 
Zhuang, X
Issue Date: 14-Jul-2015
Source: US Patent 9,079,338 B2. Washington, DC: US Patent and Trademark Office, 2015.
Abstract: A method of preparing a tip for lithography, includes forming a mold having at least one recess; disposing a first polymer in the recess to form an apex of the tip,; curing the first polymer in the recess; and disposing a second polymer in the recess to form a base of the tip. The Young's Modulus of the second polymer is lower than the Young's Modulus of the first polymer. The tip structure for lithography includes a substrate, and a layered structure including a tip having an apex of a first polymer and a base of a second polymer. The first polymer is less resiliently deformable than the second polymer.
Rights: Assignee: The Hong Kong Polytechnic Univeristy.
Appears in Collections:Patent

Files in This Item:
File Description SizeFormat 
us9079338b2.pdf3.76 MBAdobe PDFView/Open
Show full item record

Page views

95
Last Week
0
Last month
Citations as of Apr 21, 2024

Downloads

22
Citations as of Apr 21, 2024

Google ScholarTM

Check


Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.