Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/68486
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dc.contributorInstitute of Textiles and Clothing-
dc.creatorZheng, ZJ-
dc.creatorShen, YD-
dc.creatorZhou, XC-
dc.creatorZhuang, X-
dc.date.accessioned2017-08-22T05:55:11Z-
dc.date.available2017-08-22T05:55:11Z-
dc.identifier.urihttp://hdl.handle.net/10397/68486-
dc.language.isoenen_US
dc.rightsAssignee: The Hong Kong Polytechnic Univeristy.en_US
dc.titleComposite tip array for polymer pen lithographyen_US
dc.typePatenten_US
dc.description.otherinformationUS9079338; US9079338 B2; US9079338B2; US9,079,338; US 9,079,338 B2; 9079338; Appl. No. 13/467,552en_US
dcterms.abstractA method of preparing a tip for lithography, includes forming a mold having at least one recess; disposing a first polymer in the recess to form an apex of the tip,; curing the first polymer in the recess; and disposing a second polymer in the recess to form a base of the tip. The Young's Modulus of the second polymer is lower than the Young's Modulus of the first polymer. The tip structure for lithography includes a substrate, and a layered structure including a tip having an apex of a first polymer and a base of a second polymer. The first polymer is less resiliently deformable than the second polymer.-
dcterms.bibliographicCitationUS Patent 9,079,338 B2. Washington, DC: US Patent and Trademark Office, 2015.-
dcterms.issued2015-07-14-
dc.description.countryUS-
dc.identifier.rosgroupid2015001639-
dc.description.ros2015-2016 > Other Outputs > Patents granted-
dc.description.oaVersion of Recorden_US
Appears in Collections:Patent
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