Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/6305
Title: Fabric simulating the plant structure for moisture management
Authors: Fan, J
Szeto, YC
Sarkar, MK
Issue Date: 16-Jul-2013
Source: US Patent 8,486,847 B2. Washington, DC: US Patent and Trademark Office, 2013. How to cite?
Abstract: A fabric having moisture management function, which has a structure simulating plant structure and comprises at least two layers as follows: a bottom layer, which is of a leno or matt structure simulating main stem of plant, in which a number of yarns are grouped together to form a plurality of fabric units; said bottom layer can be adapted to be in contact with human skin; a top layer, which is of a plain weave structure, in which the yarns of said fabric unit further split in the top layer to form such a plain weave structure, simulating the branching in plant structure; wherein, in said fabric, water can be transported from the bottom layer to the middle layer and further to the top layer where it evaporates due to the improved capillarity of the yarns so as to provide better moisture management function.
URI: http://hdl.handle.net/10397/6305
Rights: Assignee: The Hong Kong Polytechnic University.
Appears in Collections:Patent

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