Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/6305
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dc.contributorInstitute of Textiles and Clothing-
dc.creatorFan, J-
dc.creatorSzeto, YC-
dc.creatorSarkar, MK-
dc.date.accessioned2014-01-21T01:22:22Z-
dc.date.available2014-01-21T01:22:22Z-
dc.identifier.urihttp://hdl.handle.net/10397/6305-
dc.language.isoenen_US
dc.rightsAssignee: The Hong Kong Polytechnic University.en_US
dc.titleFabric simulating the plant structure for moisture managementen_US
dc.typePatenten_US
dc.description.otherinformationUS8486847; US8486847 B2; US8486847B2; US 8,486,847; US 8,486,847 B2; 8486847; Appl. No. 11/684,452en_US
dcterms.abstractA fabric having moisture management function, which has a structure simulating plant structure and comprises at least two layers as follows: a bottom layer, which is of a leno or matt structure simulating main stem of plant, in which a number of yarns are grouped together to form a plurality of fabric units; said bottom layer can be adapted to be in contact with human skin; a top layer, which is of a plain weave structure, in which the yarns of said fabric unit further split in the top layer to form such a plain weave structure, simulating the branching in plant structure; wherein, in said fabric, water can be transported from the bottom layer to the middle layer and further to the top layer where it evaporates due to the improved capillarity of the yarns so as to provide better moisture management function.-
dcterms.bibliographicCitationUS Patent 8,486,847 B2. Washington, DC: US Patent and Trademark Office, 2013.-
dcterms.issued2013-07-16-
dc.description.countryUS-
dc.description.oaVersion of Recorden_US
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