Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/32156
Title: Silane-catalysed fast growth of large single-crystalline graphene on hexagonal boron nitride
Authors: Tang, S
Wang, H
Wang, HS
Sun, Q
Zhang, X
Cong, C
Xie, H
Liu, X
Zhou, X
Huang, F
Chen, X
Yu, T
Ding, F 
Xie, X
Jiang, M
Issue Date: 2015
Publisher: Nature Publishing Group
Source: Nature communications, 2015, v. 6, 7499 How to cite?
Journal: Nature Communications 
Abstract: The direct growth of high-quality, large single-crystalline domains of graphene on a dielectric substrate is of vital importance for applications in electronics and optoelectronics. Traditionally, graphene domains grown on dielectrics are typically only ?1 £gm with a growth rate of ?1 nm min -1 or less, the main reason is the lack of a catalyst. Here we show that silane, serving as a gaseous catalyst, is able to boost the graphene growth rate to ?1 £gm min -1, thereby promoting graphene domains up to 20 £gm in size to be synthesized via chemical vapour deposition (CVD) on hexagonal boron nitride (h-BN). Hall measurements show that the mobility of the sample reaches 20,000 cm 2 V -1 s-1 at room temperature, which is among the best for CVD-grown graphene. Combining the advantages of both catalytic CVD and the ultra-flat dielectric substrate, gaseous catalyst-assisted CVD paves the way for synthesizing high-quality graphene for device applications while avoiding the transfer process.
URI: http://hdl.handle.net/10397/32156
EISSN: 2041-1723
DOI: 10.1038/ncomms7499
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