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Title: Van der Waals interface between high-κ dielectrics and 2D semiconductors
Authors: He, J
Zuo, Y
Yang, T
Zhu, T
Yang, M
Issue Date: Feb-2025
Source: Frontiers of physics, Feb. 2025, v. 20, no.1, 014301
Abstract: Atomically thin two-dimensional (2D) semiconductors are attractive channel materials for next-generation field-effect transistors (FETs). The highperformance 2D electronics requires high-quality integration of highdielectrics, which however remains a significant challenge. In this minireview, we provide a brief introduction on recent progress in the van der Waals (vdW) integration of high- dielectrics onto 2D semiconductors. We first highlight the importance of high- dielectric integration for 2D FETs. Next, we summarize the recent breakthroughs in the various vdW integrations of high- dielectrics with 2D semiconductors, along with their interfaces’ properties. Additionally, we examine the quasi-vdW integration of conventional high- dielectrics onto 2D semiconductors. Finally, we discuss the challenges and potential future research directions in this field.
Keywords: Two-dimensional semiconductor
High-κ dielectrics
van der Waals interface
Publisher: Higher Education Press
Journal: Frontiers of physics 
ISSN: 2095-0462
EISSN: 2095-0470
DOI: 10.15302/frontphys.2025.014301
Rights: © Higher Education Press 2024
The following publication He, J., Zuo, Y., Yang, T., Zhu, T., & Yang, M. (2025). Van der Waals interface between high-κ dielectrics and 2D semiconductors. Frontiers of Physics, 20(1), 014301 is available at https://dx.doi.org/10.15302/frontphys.2025.014301.
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