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Title: Nanoimprint lithography-assisted block copolymer self-assembly for hyperfine fabrication of magnetic patterns based on L1₀-FePt nanoparticles
Authors: Zhang, J 
Chen, Y
Li, G
Sun, Z 
Meng, Z 
Wong, WY 
Issue Date: May-2025
Source: Science China : chemistry, May 2025, v. 68, no. 5, p. 2027-2034
Abstract: L10-FePt-type bit-patterned media has provided a promising alternative for ultrahigh-density magnetic recording systems in the current digital era, but rapid fabrication of magnetic patterns with hyperfine bit islands is still challenging, especially with the target for miniaturization and scalable production simultaneously. Herein, Fe,Pt-containing block copolymers were utilized as single-source precursors for solution-processable patterning and subsequent generation of the demanding magnetic FePt dots by in situ pyrolysis. High-throughput nanoimprint lithography was initially employed to fabricate the predefined bit cells precisely, and then the intrinsic self-assembly of phase-separated block copolymers further drove the formation of accurate bit islands. Benefiting from the synergistic effect of top-down lithographic approach and bottom-up self-assembly, the customizable patterns could be achieved for large-scale mass production in targeted areas, but high-density isolated dots could also be accurately aligned along the patterned features after subsequent self-assembly. This reliable strategy would provide a good avenue to precisely construct ultrahigh-density magnetic data storage devices.
Keywords: Block copolymer self-assembly
Magnetic nanoparticles
Nanoimprint lithography
Organometallic precursor
Publisher: Science in China Press
Journal: Science China : chemistry 
ISSN: 1674-7291
EISSN: 1869-1870
DOI: 10.1007/s11426-024-2333-x
Rights: © The Author(s) 2025. This article is published with open access at link.springer.com.
This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http://creativecommons.org/licenses/by/4.0/.
The following publication Zhang, J., Chen, Y., Li, G. et al. Nanoimprint lithography-assisted block copolymer self-assembly for hyperfine fabrication of magnetic patterns based on L10-FePt nanoparticles. Sci. China Chem. 68, 2027–2034 (2025) is available at https://doi.org/10.1007/s11426-024-2333-x.
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