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http://hdl.handle.net/10397/111317
| Title: | Intrinsic resputtering in pulsed‐laser deposition of lead‐zirconate‐titanate thin films | Authors: | Hau, SK Wong, KH Chan, PW Choy, CL |
Issue Date: | 9-Jan-1995 | Source: | Applied physics letters, 9 Jan. 1995, v. 66, no. 2, p. 245-247 | Abstract: | Pulsed‐laser deposition (PLD) of lead‐zirconate‐titanate [Pb(Zrx,Ti1−x)O3] (PZT) thin films under low ambient pressure has been investigated by studying the angular deposition distributions of the constituent elements of the films. Nonstoichiometric profiles are observed and a dip occurs near the target surface normal of the deposition profile of lead. Experimental results show that intrinsic resputtering of the film is important in the PLD process and is responsible for the anomalous distribution of lead. | Publisher: | AIP Publishing LLC | Journal: | Applied physics letters | ISSN: | 0003-6951 | EISSN: | 1077-3118 | DOI: | 10.1063/1.113560 | Rights: | © 1995 American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Hau, S. K., Wong, K. H., Chan, P. W., & Choy, C. L. (1995). Intrinsic resputtering in pulsed‐laser deposition of lead‐zirconate‐titanate thin films. Applied Physics Letters, 66(2), 245-247 and may be found at https://doi.org/10.1063/1.113560. |
| Appears in Collections: | Journal/Magazine Article |
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| File | Description | Size | Format | |
|---|---|---|---|---|
| 245_1_online.pdf | 602.76 kB | Adobe PDF | View/Open |
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