Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/111198
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Title: High-performance pentacene OTFT by incorporating Ti in LaON gate dielectric
Authors: Ma, YX
Han, CY
Tang, WM 
Lai, PT
Issue Date: 10-Jul-2017
Source: Applied physics letters, 10 July 2017, v. 111, no. 2, 023501, p. 023501-1 - 023501-5
Abstract: Pentacene organic thin-film transistors (OTFT) using high-k LaTiON gate dielectric with different Ti contents are investigated. The LaxTi(1-x)ON films (with x = 1, 0.87, 0.76, and 0.67) are deposited by reactive sputtering followed by an annealing in N2 at 200 °C. The OTFT with La0.87Ti0.13ON can achieve a high carrier mobility of 2.6 cm2/V·s, a small threshold voltage of −1.5 V, a small sub-threshold swing of 0.07 V/dec, and a small hysteresis of 0.17 V. AFM and X-ray photoelectron spectroscopy reveal that Ti can suppress the hygroscopicity of La oxide to achieve a smoother dielectric surface, which can result in larger pentacene grains and thus higher carrier mobility. All the devices show a clockwise hysteresis because both the LaOH formation and Ti incorporation can generate acceptor-like traps in the gate dielectric.
Publisher: AIP Publishing LLC
Journal: Applied physics letters 
ISSN: 0003-6951
EISSN: 1077-3118
DOI: 10.1063/1.4993157
Rights: © 2017 Author(s).
This article may be downloaded for personal use only. Any other use requires prior permission of the author and AIP Publishing. This article appeared in Ma, Y. X., Han, C. Y., Tang, W. M., & Lai, P. T. (2017). High-performance pentacene OTFT by incorporating Ti in LaON gate dielectric. Applied Physics Letters, 111(2) and may be found at https://doi.org/10.1063/1.4993157.
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