Achieving cognitive mass personalization via the Self-X cognitive manufacturing network : an industrial knowledge graph- and graph embedding-enabled pathway

Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/102375

Title:	Achieving cognitive mass personalization via the Self-X cognitive manufacturing network : an industrial knowledge graph- and graph embedding-enabled pathway
Authors:	Li, X Zheng, P Bao, J Gao, L Xu, X
Issue Date:	Mar-2023
Source:	Engineering, Mar. 2023, v. 22, p. 14-19
Publisher:	Gaodeng Jiaoyu Chubanshe
Journal:	Engineering
ISSN:	2095-8099
EISSN:	2096-0026
DOI:	10.1016/j.eng.2021.08.018
Rights:	© 2021 THE AUTHORS. Published by Elsevier LTD on behalf of Chinese Academy of Engineering and Higher Education Press Limited Company. This is an open access article under the CC BY-NC-ND license (http://creativecommons.org/licenses/by-nc-nd/4.0/). The following publication Li, X., Zheng, P., Bao, J., Gao, L., & Xu, X. (2021). Achieving cognitive mass personalization via the self-X cognitive manufacturing network: an industrial knowledge graph-and graph embedding-enabled pathway. Engineering, 22, 14-19 is availale at https://doi.org/10.1016/j.eng.2021.08.018.
Appears in Collections:	Journal/Magazine Article

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