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Title: Microstructure defects mediated charge transport in Nb-doped epitaxial BaTiO₃ thin films
Authors: Zhou, J
Jing, X
Alexe, M
Dai, J 
Qin, M
Wu, S
Zeng, M
Gao, J
Lu, X
Liu, JM
Issue Date: 5-May-2016
Source: Journal of physics. D, Applied physics, 5 May 2016, v. 49, no. 17, 175302
Abstract: Nb-doped BaTiO₃ (BNTO) films were deposited on MgO substrates at different substrate temperatures by pulsed laser deposition. The temperature dependence of their resistivity, carrier mobility and carrier concentration were systematically investigated. It reveals that the BNTO films deposited at lower temperature show higher resistivity and lower carrier mobility, and only show semiconductor characteristics at measurement temperatures ranging from 10 to 400 K. There is a metal-semiconductor transition at about 20 K for the films grown at relatively higher temperature. The intrinsic mechanism responsible for the different charge transport behavior was revealed by microstructure studies. Low crystal quality and high density of microstructure defects, observed for BNTO films grown at low temperatures, are, in particular, massively affecting the charge transport behavior of the BNTO films. The mediated charge transport of the microstructure defects is dominated by the thermal excitation process.
Keywords: BaTiO3
Carrier mobility
Charge transport
Conductivity
Microstructure defects
Publisher: Institute of Physics Publishing
Journal: Journal of physics. D, Applied physics 
ISSN: 0022-3727
EISSN: 1361-6463
DOI: 10.1088/0022-3727/49/17/175302
Rights: © 2016 IOP Publishing Ltd
This is the Accepted Manuscript version of an article accepted for publication in Journal of physics. D, Applied physics. IOP Publishing Ltd is not responsible for any errors or omissions in this version of the manuscript or any version derived from it. The Version of Record is available online at https://doi.org/10.1088/0022-3727/49/17/175302.
This manuscript version is made available under the CC-BY-NC-ND 4.0 license (https://creativecommons.org/licenses/by-nc-nd/4.0/).
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