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http://hdl.handle.net/10397/91563
Physical Vapour Deposition System (PVD)
• Arc and magnetron sputtering coating process
• Process temperature up to 400℃
• Sample size: 200mm x 200mm
• Target available: C, Cu, Al, Zr, Cr, Ti, TiAl, TiAlCr, SS 316 or user’s target.
• Coating example: ZrN, ZrCN, ZrO, CrN, CrCN, TiN, TiO, TiCN, TiAlCrN, etc
• In-situ plasma treatment for cleaning and etching
• Applicable substrate: Polymer, glass, metals and ceramic
More Information:
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- Industrial Centre
- Equipment
- Surface Engineering
- Coatings
- Surfaces (Technology)
- PVD
- Sputting
- Target
- TiN
- ZrN
- Plasma treatment
- Available for PolyU staff and students
- PolyU students, faculty and staff
- Yes
W401
- Mr TANG Chi-hung Vincent
- Industrial Centre
- 27667621
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