Please use this identifier to cite or link to this item:
http://hdl.handle.net/10397/1622
DC Field | Value | Language |
---|---|---|
dc.contributor | Institute of Textiles and Clothing | - |
dc.creator | Li, Y | - |
dc.creator | Hu, JY | - |
dc.date.accessioned | 2010-01-02T15:54:36Z | - |
dc.date.available | 2010-01-02T15:54:36Z | - |
dc.identifier.uri | http://hdl.handle.net/10397/1622 | - |
dc.language.iso | en | en_US |
dc.rights | Assignee: The Hong Kong Polytechnic University. | en_US |
dc.subject | Woven moisture management fabrics | en_US |
dc.title | Woven fabric with moisture management properties | en_US |
dc.type | Patent | en_US |
dc.description.otherinformation | US7565920; US7565920 B2; US7565920B2; US7,565,920; US 7,565,920 B2; 7565920; Application No. 11/521,616 | en_US |
dc.description.otherinformation | Inventor name used in this publication: Jun-Yan Hu | en_US |
dcterms.abstract | A technique allowing manufacturers to produce woven moisture management fabrics with good moisture transfer properties is based upon a model of the fabric construction, thereby avoiding a manufacturing trial-and-error process. An initial woven fabric design including hydrophilic and hydrophobic yarns are modeled, the warp and weft yarns generally lying in a plane of the fabric. By orthographic projection onto respective planes substantially parallel to the plane of the fabric, a first view and an opposing second view of a unit cell of the model is produced. If the total projected area of hydrophobic yarn on one of the first and second views is between 40% and 70% of the total projected area, and total projected area of hydrophilic yarn on the other of the first and second views exceeds 50% of the total projected area, then a fabric according to the fabric design will have near optimum moisture wicking properties and is manufactured to the design. Otherwise, in an iterative process, one of the factors in the model is varied and the design steps repeated. | - |
dcterms.bibliographicCitation | US Patent 7,565,920 B2. Washington, DC: US Patent and Trademark Office, 2009. | - |
dcterms.issued | 2009-07-28 | - |
dc.description.country | US | - |
dc.description.oa | Version of Record | en_US |
Appears in Collections: | Patent |
Files in This Item:
File | Description | Size | Format | |
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us7565920b2.pdf | 430.74 kB | Adobe PDF | View/Open |
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