Please use this identifier to cite or link to this item: http://hdl.handle.net/10397/91563
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Physical Vapour Deposition System (PVD)

• Arc and magnetron sputtering coating process

• Process temperature up to 400℃

• Sample size: 200mm x 200mm

• Target available: C, Cu, Al, Zr, Cr, Ti, TiAl, TiAlCr, SS 316 or user’s target.

• Coating example: ZrN, ZrCN, ZrO, CrN, CrCN, TiN, TiO, TiCN, TiAlCrN, etc

• In-situ plasma treatment for cleaning and etching

• Applicable substrate: Polymer, glass, metals and ceramic

Owned by:
  • Industrial Centre
Category:
  • Equipment
Function:
  • Surface Engineering
Subjects:
  • Coatings
  • Surfaces (Technology)
Keywords:
  • PVD
  • Sputting
  • Target
  • TiN
  • ZrN
  • Plasma treatment

Shareability:
  • Available for PolyU staff and students
Eligible User:
  • PolyU students, faculty and staff
Fee:
  • Yes
Name:
  • Mr TANG Chi-hung Vincent
Department:
  • Industrial Centre
Tel:
  • 27667621

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