Extending electrochemical replication and transfer

Abstract

Patterning techniques are of great importance in various applications such as integrated circuits, display, micro-electromechanical systems, microfluid devices, and photonics. Extensive work has been done in developing patterning techniques, such as photolithography, electron beam lithography, nanoimprint lithography, scanning probe lithography, soft lithography, inkjet printing, screen printing, etc. Recently, a new patterning technique called electrochemical replication and transfer (ERT) has been developed by our group which aims to achieve high resolution, high throughput and low cost at the same time. ERT process consists of two major steps. One step is the electrochemical replication of pattern on designed template. The other key step is the transfer of patterned materials from template onto target substrate. To assist the transfer, a layer of self-assembled 1H,1H,2H,2H-Perfluorodecanthiol (PFDT) on gold is used as release layer to decrease the adhesion between electrodeposited layer and the template. In this thesis, we employ a thin layer of chromic oxide to replace PFDT and demonstrate the applicability of ERT (Cr2O3) in obtaining various geometric patterns with different materials on various substrates. The application of ERT (Cr2O3) in the fabrication of stretchable conductor and micro-supercapacitor is also demonstrated. The mechanism of ERT (Cr2O3) process was analyzed. In conclusion, ERT (Cr2O3) is explored in obtaining various geometric patterns with different materials on various substrates to extend the electrochemical replication and transfer technique. The mechanism of ERT (Cr2O3) process is analyzed from electrocrystallization and adhesion perspectives.